Used CVD Equipment
245 resultsCVD Ti&CVD TIN Wafer Size 200mm Location : ASIA (North East)
Price : On request
More detailsDelta Teos / 3Ch Wafer Size 6" Year(s) : 1995 Location : ASIA (North East)
Price : On request
More detailsDelta TEOS DxL / 3C/H Wafer Size 8" Year(s) : 1998 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsBrand: JPEL P-CVD Lead Time Immediately Year(s) : 1999 Location : ASIA (North East)
Price : On request
More detailsDxL Wafer Size 8" Location : ASIA (North East)
Price : On request
More detailsVertical Furnace for LPCVD SOD Process Version: 200 mm Vintage: 01.06.2007 Vintage 2007.01 Software OS L Year(s) : 2007 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSputtering System 2400 – 8L Load Lock Sputter Deposition Coater Comes with AE MDX 1K RF Power Generator Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details8 inch substrate. Manual load/unload. Vacuum function. Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPVD cluster tool Version: 150 mm Vintage: 01.06.1990 This tool was not operational prior to removal and has m Year(s) : 1990 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsICP PECVD system for solar cells production Version: Solar Vintage: 01.06.2015 -STILL INSTALLED. IN EXCELLENT Year(s) : 2015 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSpecification : Wafer Size: 200mm Robot: HP(buffer and Transfer) Loadlock: Narrow Bod Location : EUROPE (Western and Northern)
Price : On request
More detailsCMP Manufacturer AMAT Model Reflexion Location : EUROPE (Western and Northern)
Price : On request
More detailsWAFER SIZE 12 Location : EUROPE (Western and Northern)
Price : On request
More detailsMaterials Research Corp. 8671 RF Sputtering Vacuum Chamber Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size Range Maximum 150 mm Set Size 125 mm Controller Type Microprocessor Controller Type Contr Year(s) : 1997 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsFeatures 2 - 4 channel valve control PCB (for the nupro valves) • 1/8" tubing for the nupro valves (~40 ft) • Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsTyp: 10000186 UV 300/400 50 Hz 3” Chuck, 4” x 4” Mask Holder Objectiv Leitz 5x 0,09; 10x 0,20; 20x 0,40; 32 Year(s) : 2004 Location : EUROPE (Western and Northern)
Price : On request
More detailsDescription PECVD TEOS with Load Lock Wafer Size Range Maximum 200 mm Process PECVD & TEOS Controller T Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsVacuum System None Vacuum System Chamber made up of the 8" CF 4-way cross, M/N: 600-4T, 304SS 8" CF Door/V Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDescription In-Line Sputtering System Vacuum System Diffusion Pumped Load Lock Included Yes Power Requireme Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDescription Gen 5 PEVCD Chamber - New Accessories Substrate Size: 1200 mm x 1300 mm Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsGen 6 PEVCD Chamber - Accessories Substrate Size: 1500 mm x 1850 mm MKS ASTeX Remote Plasma Source, Model: Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsReticle Handler Model RSR160 Year(s) : 2013 Location : EUROPE (Western and Northern)
Price : On request
More detailsManufacturer Noevllus DKN config Year(s) : 2008 Location : EUROPE (Western and Northern)
Price : On request
More details• Process: PECVD iN,SiO2, i-a-Si, SiON and N+ a-Si • SoFware Version: AKT7.3 • System Power RaNng: 208 VAC 3-P Year(s) : 2005 Location : EUROPE (Western and Northern)
Price : On request
More detailsYou can find used CVD Equipment on Wotol
The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson
The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG
HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.