EVG 610, Semi-automated Mask Alignment System

Brand: EVG
Model: 610
SEMI-AUTOMATED MASK ALIGNMENT SYSTEM

Specifications
• Used
• Optimum total cost of ownership (TCO) for R&D and pilot line production
• Supports back side lithography and bond alignment
processes when configured with bottom side microscopes
• Sub-micron exposure gap repeatability in proximity exposure mode
• Windows® based user interface similar to the widely installed
and well established EVGR620/6200 series
• Perfect multi user concept (unlimited number of user accounts,
various access rights, different user interface languages)
• Unmatched exposure light uniformity at wafer level, down to ± 1.5% for small substrate applications
• Maintenance free and highly precise monolithic air bearing stage