Allwin21

Allwin21 Corp. AccuThermo AW 610 RTP

Wafer Size: Small~6 inch
Type: Desktop, Atmospheric
Temperature: 100~800°C or 450~1250°C
Gas Lines: 1 ~ 6 lines
Chamber Design: AG Associates Heatpulse 610

Specification:
Wafer handling: Manual loading of wafer into the oven, single wafer processing.
Wafer sizes: 2″, 3″, 4″ ,5″ , 6″ wafers.
Ramp up rate: Programmable, 10°C to 200°C per second.
Recommended steady state duration: 0-300 seconds per step.
Ramp down rate: Programmable, 10°C to 250°C per second. Ramp down rate is temperature-and-radiation-dependent and the maximum is 125°C per second.
Recommended steady state temperature range: 150°C – 1150°C
ERP temperature accuracy: ±1°C, when calibrated against an instrumented thermocouple wafer (ITC).
Thermocouple temperature accuracy: ±0.5°C
Temperature repeatability: ±0.5°C or better at 1150°C wafer-to-wafer. (Repetition specifications are based on a 100-wafer set.)