Oxford Instruments NGP80

- Single Chamber PECVD, non-load locked
- Ideal for R&D
- Process: Oxide and Nitride
- Internal Gas Box with 5 process gases (currently set up for: H2, NH3, Ar/5% SiH4, CHF4, N20, N2)
- Dual frequency RF
- System setup with universal platen (with ability to place various size(s) of substrates).
- Up to 200mm wafer capable
- System PC, Keyboard, Mouse
- Edwards Vacuum Pump
- Vintage 2011
- 208V AC, 60Hz