Oxford Instruments OPAL ALD

• Configuration: Open-loop (non-loadlocked) chamber
• Precursor channels: 2 for metal-organic precursors, 1 for water
• Plasma source: 300 W RF plasma head with isolation valve
• Table size: 8.25" heated table
• Table temperature range: 80–300°C
• Sidewalls: Heated
• Software: Loop-based control for dose/purge ALD cycles
• Substrate compatibility: Circular, flat, up to 8.25" diameter
• Substrate temperature tolerance: 100–250°C depending on process
• Limitation: Not suitable for very small samples or powders
• Power requirements: 208V, 3 phase, 60 Hz, 25A