Plasmatherm SLR720

Plasmatherm SLR-720 RIE tool
Configured for etching of metals and compound semiconductors
Previous usage was etching of GaAs with chlorine chemistry
PC controller. Vacuum load lock with wafer transfer robot.
Can process wafers from 2” to 8” depending on which process kit is installed.
Currently configured with 4” kit.
Helium backside thermal cooling in conjunction with computer controlled substrate clamping.
High frequency RFPP plasma source 13.56mHz
Closed loop pressure control.
Leybold Turbo pump.
Total of six MFC gas controllers. Previous gases used N2, O2, He, CHF3, Cl2, BCL3
Includes Thermo Neslab water chiller