Tepla 300

Ref : 2427907-9

Condition : Used

Manufacturer : Tepla

Model : 300

Year(s) : 2000

Quantity : 1

Location : Seller or machines location:
AMERICA North (USA-Canada-Mexico)

Last check : 04 Mar. 2025

- Manual Wafer Load Plasma Asher
- Used for Wafer Cleaning and Descum
- Can Process up to 150mm Wafers
- Faraday Cage
- Upgraded PLC Controlled
- Plasma Chamber: Quartz
- Plasma Chamber Dims: 245mm Diameter, 380mm Depth
- Plasma Generation: 2.45 GHz Max / 1,000 Watt Variable
- Gas Lines: N2 Gas Input and 2 Process Gas Inputs
- All MFCs Rebuilt and Calibrated
- Vacuum Pump (Professionally Rebuilt)
- Operators Manual for Tepla 300

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