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Tepla 300
Ref :
2427907-9-W
Condition :
Used
Manufacturer :
Tepla
Model :
300
Year(s) :
2000
Quantity :
1
Location :
Seller or machines location:
AMERICA North (USA-Canada-Mexico)
AMERICA North (USA-Canada-Mexico)
Last check :
13 Dec. 2023
- Manual Wafer Load Plasma Asher
- Used for Wafer Cleaning and Descum
- Can Process up to 150mm Wafers
- Faraday Cage
- Upgraded PLC Controlled
- Plasma Chamber: Quartz
- Plasma Chamber Dims: 245mm Diameter, 380mm Depth
- Plasma Generation: 2.45 GHz Max / 1,000 Watt Variable
- Gas Lines: N2 Gas Input and 2 Process Gas Inputs
- All MFCs Rebuilt and Calibrated
- Vacuum Pump (Professionally Rebuilt)
- Operators Manual for Tepla 300
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