Used CVD Equipment
209 resultsThis furnace can handle wafers up to 150mm Configuration: N2 - 1500 l/min N2 - 660 l/min Forming Gas 660l Year(s) : 2000 Location : EUROPE (Western and Northern)
Price : On request
More detailsThis furnace can handle wafers up to 150mm Configuration: N2 - 1500 l/min N2 - 660 l/min Forming Gas 660l Year(s) : 1994 Location : EUROPE (Western and Northern)
Price : On request
More details4x Standard SNIT Chambers Year(s) : 1993 Location : EUROPE (Western and Northern)
Price : On request
More detailsP5000 CVD Condition Very Good Serial Number(s) 4558 Year(s) : 1995 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer Size Range Minimum 150 mm Maximum 150 mm Set Size 150 mm Number of Chambers 4 Condition Ver Year(s) : 2000 Location : EUROPE (Western and Northern)
Price : On request
More detailsCassette to Cassette YES Accessories We sell the whole tool. CE Marked YES Condition Very Good Serial Num Year(s) : 2001 Location : EUROPE (Western and Northern)
Price : On request
More detailsDescription CVD Deposition with ECR source Wafer Size Range Minimum 50 mm Maximum 300 mm Controller T Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDescription PECVD TEOS with Load Lock Wafer Size Range Maximum 200 mm Process PECVD & TEOS Controller T Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsVacuum System None Vacuum System Chamber made up of the 8" CF 4-way cross, M/N: 600-4T, 304SS 8" CF Door/V Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDescription In-Line Sputtering System Vacuum System Diffusion Pumped Load Lock Included Yes Power Requireme Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsThin Flim Deposition Controller Other Information System Components: Control unit: P/N 753-003-G1 Sensor cont Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDescription Gen 5 PEVCD Chamber - New Accessories Substrate Size: 1200 mm x 1300 mm Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsGen 6 PEVCD Chamber - Accessories Substrate Size: 1500 mm x 1850 mm MKS ASTeX Remote Plasma Source, Model: Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsLow Energy Implanter 200mm Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsIon implanter Year(s) : 2013 Location : ASIA (North East)
Price : On request
More detailsCVD: MOCVD Year(s) : 2008 Location : ASIA (North East)
Price : On request
More detailspvd: Sputter/4in. Year(s) : 2012 Location : ASIA (North East)
Price : On request
More detailsCVD: MOCVD/4in. Year(s) : 2007 Location : ASIA (North East)
Price : On request
More detailsCVD: MOCVD/6in Model AIX2800G4 Year(s) : 2008 Location : ASIA (North East)
Price : On request
More detailsCVD: APCVD Maker AMAYA Model AEC2250SP-296 Location : ASIA (North East)
Price : On request
More detailsCVD: APCVD Year(s) : 1998 Location : ASIA (North East)
Price : On request
More detailsPVD:Sputter Maker TEAMS CORPORATION Year(s) : 2018 Location : ASIA (North East)
Price : On request
More detailsTEL NEXX APOLLO HP PVD SYSTEM SPT03 RFL02 SemiGEAR Reflow Tool Year(s) : 2012 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsAMAT, 300mm Tool ID: TC-TSA-01 Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsCVD: APCVD/6in Location : ASIA (North East)
Price : On request
More detailsYou can find used CVD Equipment on Wotol
The main manufacturers of CVD Equipment are AMAT, TEL, Applied Materials, Plasmatherm, Novellus, Aixtron, Oxford, ASM, Kokusai, Varian, Anelva, CVC Products, Canon, CVC, Aixtron, Anatech, Applied, Centrotherm, DNS, Emitech, ESC, First, Hitachi, Industrial, J.C. Schumacher, Jusung Engineering, Kas, Kokusai, Lam Research, Leybold, Matheisson, Mattson, MRC, Novellus, Novellus Systems, Oxford Instruments, Perkin Elmer, SVG, Technica, TEL, Tempress, Tepla, Thomas Swan, Ulvac, Unaxis, Varian, Veeco, Watkins Johnson
The main model P5000Series, Quixace, UltimaX, OCEAN, PXJ-200, C1 TEOS, A412, Eagle XP8, IDC S6961, C-7100GT, K950, 790Series, SLR 730, 643, 7300, 2400-SSA, 601, PT530, Plasmalab 800Series, Raider ECD210 / R310PD23SRD6CFD06AY03, LT-210C 2-2-1, 5000, ATS-15 TLC ABU/TLC, ILC-1012, SRH820, SV-9040-T14, I-2300SRE, APT4800, P-5000, TC2300, SJF-1000, 80B, Eagle-10, ALPHA-303i, L-430S-FHL, VDS-5600, SPEED C2, Endura 5500, SLR-770, NGP1000, TS-81003, Eureka 2000, Ultima X, PEIIA, 1500, 999R, Z-550, SE APF, AMP-3300, ET 3000, Concept-1 200, SC-W60A-AVFG
HS Code 8486 30 21 for Chemical Vapour Deposition (CVD) equipment
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.