Used Lithography & Photoresist
211 resultsBrewer Science CEE/Brewer Science 4000. Fully programmable automated coat/bake track system * System is ful Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsBrewer Science CEE CB-100 Coat Bake Track * Cost Effect Engineering * Excellent Condition * Portable bench to Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsBrewer Science CEE 100CB Coat / Bake Track * Brewer Science * Cost Effect Engineering * Excellent Condition Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSVG Dual Track Photoresist Coater and Developer * EQP-00556 * Coat controllers: 8126 PC / 8136 HPO * Develo Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsMTI Flexifab Photoresist Coater * System can be configured to specific customer request. * Up to 8" capabilit Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsMTI Flexifab Photoresist Coat and Bake System * System configuration: 1ea Controller 1ea Send/Receive Module Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details<b>1 x KARL SUSS MJB-55 Mask Aligners</b> Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details<b>Manufacture : DNS Model : SKW-60A-AVP Vintage: June 1992 <u>1 Coat & 1 Developer</b></u> <b>Specification: Year(s) : 1992 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsUsed <b> Manufacture : Nanometrics Model : NaoSpec/AFT 200 Model Number : 7001-0081 Desc : Film Thickness Meas Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsUsed <b> Manufacture : Semix Model : TR6132U Desc : Spin On Glass(SOG) Coater </b> Details: Wafter Size : 4 i Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details<b>Brand: Fusion Model: M150PC Year: 1994 <u>UV Stablizer </b></u> <b>Details:</b> used Wafter Size : 4 inch Year(s) : 1994 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsYou can find used Lithography & Photoresist on Wotol
The main manufacturers of Lithography & Photoresist are Canon, MTI, ASML, Karl Suss, SVG, Fusion, IDI, Verteq, Balzers, Convac, EVG, Varian, Brewer Science, Dainippon Screen, Accent Optical, Alcan Tech, AMAT, APT, Atma, Axcelis, Beta, BLE, Branson / IPC, CB, Chemitronics, CMP, C-Sun, Cybor, Denton, DNS, E M S, Edwards , EFD, Electroglas, EMS, Fairchild, Headway, Matsushita, Nanometrics, NRC, OAI, Orbotech, PSK, PVA, Semix, Solitec, Soltec, Suss Tamarack, TEL, Thermo, Ultratech,
The main model CS800M, 5110C, Delta 80, XT: 1250B, XT:1700GiSeries, SD-80BW-AVPE, M515-III, Q300, M515, Series 2000, PS3, SD-80BW-AVP, Tera 21, 1000, 1200, APT 9154-EP,, 6SCW-60A-AV, 150, Paragon 8800 Hm, Y60-1095-R00 XY stage, FPA-3000Series, FPA-2500 i3, Accudose 9000, MAS-8000, E-280, E2000-5KAC, 810, CSL-A25, AT-EW80P, PWM32, 400, ACT12(1C2D), OS2000, 150 PC, 610, 620, 200 PCU, SCS-4393, 3E, CFM8050, 8626/36/32MD, Coat Develop Track, 200 PCU, PLA - 501 FA, MJB 21, MASeries, PLA - 501 FA, BAK 600 CE, 90S Series, 6000, 1000-3, 1000-1, 200Series, TR6132U, M150PC, BDJ-1800, HiPR-6512, M.A.750, 3300 series, HSA-2", 645, VE10, DV-503FP, CVE15, NRC 3115, 8260M Two Target RF, CV18, PSE43, 1854 32", 3177, 3117 E, BA709, BA510, CV18, DV-504, SCS800, 2001, 1034, 8836 HPOSolitec FLEXIFAB, Imprio 55, L3200, 640, MJB-55,
HS Code 8486 90 23 for ion implanters for doping semiconductor materials; of apparatus for physical deposition by sputtering on semiconductor wafers; of physical deposition apparatus for semiconductor production; of direct write-on-wafer apparatus, step and repeat aligners and other lithography equipment
HS Code 8486 90 46 for pattern generating apparatus of a kind used for producing masks or reticles from photoresist coated substrates, including printed circuit assemblies
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this Chapter; parts and accessories.