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Used Wafer Equipment

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1

Laser Identification Systems, Inc. model Wafermark II Vintage May 1984 Year(s) : 1984 Location : AMERICA North (USA-Canada-Mexico)

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Serial Number: 062207/031291 Wafer Size: 100mm Three track Coat/Develop System Computer operated Track system Location : AMERICA North (USA-Canada-Mexico)

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Serial Number: 219673 Wafer Size: 200mm RIE system Manual Load lock system Alcatel 600T Turbo pump and co Location : AMERICA North (USA-Canada-Mexico)

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Serial Number: AK200176 Wafer Size: 200mm MicroTec Delta 20T2 Manual Coat Spinner with Delta 150 VPO Hot plate Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)

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Version: 200 mm Vintage: 01.06.2005 WaferStorm Wet Processing Platform The WaferStorm platform is the indus Year(s) : 2005 Location : AMERICA North (USA-Canada-Mexico)

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2” to 6” (dia.) Wafer Capability Sheet Resistance Range: 1.1 mΩ/sq to 450 KΩ/sq Slice Resistivity Range: 4.19 Location : AMERICA North (USA-Canada-Mexico)

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Wafer Inspection Microscope Version: 300 mm Year(s) : 2011 Location : AMERICA North (USA-Canada-Mexico)

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8100 SEM Part 740-03565-000 Location : AMERICA North (USA-Canada-Mexico)

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Backside Laser Ablation Tool Cassette to Cassette YES Location : AMERICA North (USA-Canada-Mexico)

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Laser Wafer ID Marking Tool Cassette to Cassette YES Condition New-Never Used Location : AMERICA North (USA-Canada-Mexico)

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P-1 Long Scan Profiler is a computerized, high-sensitivity surface profiler that measures roughness, waviness, Location : AMERICA North (USA-Canada-Mexico)

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Brooks Automation VacuTran VT-2 vacuum robotic wafer handler, 6" frog leg, Factory rebuilt Location : AMERICA North (USA-Canada-Mexico)

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PRI Equipe Technologies VAC400 robot. Two in stock s/n VAC-1079, VAC-1086 Location : AMERICA North (USA-Canada-Mexico)

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Micro Automation 2006 wafer cleaner, 6" capacity. Location : AMERICA North (USA-Canada-Mexico)

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Up to 300mm round or 8" square substrates 0-3000rpm spin range 1-2,000rpm/sec acceleration 300mm wafer centeri Location : AMERICA North (USA-Canada-Mexico)

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A Zoom video system with 2x/5x/10x/50x objectives XYZ-theta motorized stage with joystick control Optional PC Location : AMERICA North (USA-Canada-Mexico)

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PM-5 manual prober with 6in vacuum chuck and Mitutoyo FS60 microscope with motorized XY Location : AMERICA North (USA-Canada-Mexico)

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Leica objectives 3.5x/10x/20x 350W lamphouse with Ushio USH-350DS Hg lamp UV400 near UV optics, 350-450nm, 0. Location : AMERICA North (USA-Canada-Mexico)

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Programmer 10 programs of up to 10 steps each Custom base cabinet with pull out photoresist cannister tray Max Location : AMERICA North (USA-Canada-Mexico)

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wafer diameter 2"-6" heated wafer stage Location : AMERICA North (USA-Canada-Mexico)

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die matrix expander max 150mm wafers Location : AMERICA North (USA-Canada-Mexico)

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[ General Description ] Wafer Size : 2 ~8 inch Illumination Source : 8mW laser, 635 nm wavelength Operator Int Year(s) : 2006 Location : ASIA (North East)

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Capable up to 12" Wafer ■ SSM 52 Capacitance Measurement Unit ■ Motor control unit ■ Pneumatic control Unit ■ Year(s) : 2010 Location : ASIA (North East)

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Configuration: - Wafer Size : 4 - 8 inch. - Non-patterned surface Inspection System. - 0.1 micron Defect Sensi Year(s) : 1995 Location : ASIA (North East)

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Process: wafer Sheet Resistance measurement *. Measurement perfomance: - 4 Point Probe check surface on Silico Location : ASIA (North East)

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You can find used Wafer Equipment on Wotol

The main manufacturers of Wafer Equipment are KLA-Tencor, Karl Suss, Canon, Electroglas, Suss, Nikon, Semitool, TEL, Tokyo Semitsu Kogaku (TSK), Branson / IPC, MGI, Ultron, EVG, Allwin21, Abm, Accretech, ADE, AG Associates, AIO, Alessi, Applied Materials, ASM, ASML, Asyst Technologies, ATMI, Axcelis, Brooks Automation, Buehler, Cambridge, Cascade, Cascade Microtech, CDE (Creative Design Engineering), CEE, CHA, Control Micro Systems (CMS), Cymer, Dainippon Screen,Dektak, Denton, Disco, DNK, DNS, Dynapert, Dynatex, Electroglass, EV Group, Evergreen, Faith, Fluoroware, Fortrend Engineering, Gasonics, GCA, GSI Lumonics, Hitachi, HTG, IMT, InspecTech, Ionic Systems, Jeol, K & S, Kensington, KLA, Kokusai, LAM, Lam Research, Leica, Lintec, Loomis, Lumonics, Mactronix, Matsushita, Mech-El, Micro Automation, MRC, MTI, Nanometrics, Nitto, OAI, Olympus, Oriel, Oxford, Perkin Elmer, PRI, Prometrix, Recif SA, Rucker & Kolls, Suss MicroTec, SVG, Takatori, Tegal, Tencor, Tropel, Ultracision, Ultratech, Ulvac, Veeco, Verteq, Wentworth, Xynetics

The main model  MPASeries, CDS-650CT, PLA-501F, MA-4100, NSR-1505G4, 1000, Titan II, MA150,  6033, 2029,2020,2025, 6200Series, SM200E, Step 200,UM810, UH-130, UF3000 EX, SFX100, M777, FPA-5500iZa, SR8220-019, Desktop 1, 270 SRD, ST-260, 1600-55, 8100XP, 8100Series, 1H-DX, KP-4200, MA-4201Series, MA-1006, L200,UH130M,DFM-M150, CEE 100, SP323, MJB3Series, JWSSeries, MA6Series, SWC4000, EX-5700, 2001X, MDA-60FA, 680A, 8300, ARM200CF, S-5200, S-4700, AS5000, Axiotron II, INS330, Axiospect 301, SF 600, WaferMark II,3308, MASeries, 20T2/150VPO, 860, 1600-55A, UH 102, 4000, Eureka 450, ETI0392A-6-U, 425130, ETII-6910B-X-V, EET1-0395D-X-U, ETII-6910B-X-V, F-6225, 827, 907, 211,UVSeries, AIT8010, eCD2, 8100XPR, CD-SEMSeries, 8250, PC 4400, 300405, SFS 6420, 6D, MM-Cascade 6100, MJB-55, 179884/ P-2 OPEN FRAME, 8300X, 4500, ATRM-2100, SWC11, MAS-8000,ATM-1100E, 3A, 90, RTP-600xp, UKA-650, SPP8, MP 2300, BH-BHM, 2066,AL100-L8, IDLW8R, REL-4500, IDLW8R, MAS-8000, Fix Load25, UKA-825, SCW111, ATRM-2100D, 4055/2, Optistation 3, REL-4500, ResMap 178, 8097, 1600-55m, LSD 100, DSL 10, H100, RHM-06, 908, UH-130, 600W, 100FX, RS 35, P16+, 8620, MA8/BA8 Gen3, lle-855SS, 85DD, SFS7700, 2300 Versys, ZX-1000, Mark7, S-7800HSA, 5610,ES3, M-GAUGE 200, AITI,SFS7200, THERMA-WAVE OP 2600, MA150, 2115, 9400, NGP80, 620, XRF3640, CTR-200, TREX 610, F-4225, EET10395-4-U, SYO-200SS, MS100, RS-75, 7400/18, 2001X 6, PLA-501FA, PS300 Parametric Serie 12, DX-III, SHS 1000VAC, V300-Si, 12", WM650, AlphaStep 300, SURFSCAN 7700, 903eSeries, F6000QS, SP1 TB1, Nanolab 600, NWL860-TMB-SP, F5, DSS200, RS35C, MX-50, DD-823V-8BL, MicroSense 6300, 2400, 4400,E5200, 8108, 600FA, 40, MRC 603, 7700, VersaPort 2200, R-3, SSEC M10, ST-270 SRD, L3510, HTC 8020, Lumonics III, 1800-6AR, HTC 4000, SSW-60A-AR, 1034X, WST 306, ST-860, KIS 2000, L3510E, 9350, PSM 6, 80B, RS-35, DR-8500 II, 301, VLR RIE LM/TM, 20T2/150VPO, 1034 XA – 6, 4085XSeries, 682A, 500R 120-1007, E8025S, 100 RIE, M6000L, EV CS50, 150, RC8, ATM-105-1-S-CE-S293, MPC3000, DMI4000B, 5100, F5x, P-10, LP-200H, F200, CMS1030, CW1002-6200RW, 8860, APM90A, 3001X, APM5000, 880

HS Code 8486 10 10 for Apparatus for rapid heating of semiconductor wafers. 
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devicesde8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices

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