Used Wafer Equipment
450 resultsModel: Matrix 209S Category: Plasma Asher Descum OEM: Matrix Condition: Refurbished with OEM specifications an Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsModel: Matrix 105 Category: Plasma Asher Descum OEM: Matrix Condition: Refurbished with OEM specifications and Location : AMERICA North (USA-Canada-Mexico)
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More detailsModel: Gasonics Aura 2000LL Category: Plasma Asher Descum OEM: Gasonics Condition: Refurbished with OEM specif Location : AMERICA North (USA-Canada-Mexico)
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More detailsModel: Gasonics L3510 Category: Plasma Asher Descum OEM: Gasonics Condition: Refurbished with OEM specificatio Location : AMERICA North (USA-Canada-Mexico)
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More detailsModel: Heatpulse 8108 Category: Rapid Thermal Processor OEM: AG Associates Condition: Refurbished with OEM spe Location : AMERICA North (USA-Canada-Mexico)
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More detailsModel: Heatpulse 4100S Category: Rapid Thermal Processor OEM: AG Associates Condition: Refurbished with OEM sp Location : AMERICA North (USA-Canada-Mexico)
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More detailsModel: Heatpulse 4100 Category: Rapid Thermal Processor OEM: AG Associates Condition: Refurbished with OEM spe Location : AMERICA North (USA-Canada-Mexico)
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More detailsFour Cassette Platforms 3 Axis Wafer Handling Robot Wafer Prealigner Station OCR Reader PC Controlled Location : AMERICA North (USA-Canada-Mexico)
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More detailsConfiguration: Configured as shown in pictures. Details coming soon ! Tester interface is not included. Teste Year(s) : 2005 Location : AMERICA North (USA-Canada-Mexico)
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More detailsExcellent operational condition Serial No: F12007JX Year(s) : 2003 Location : AMERICA North (USA-Canada-Mexico)
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More detailsExcellent operational condition Serial No: F02088KR Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
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More detailsConfiguration: KLA-Tencor 8100XP CD-SEM is an advanced metrology instrument with capability to provide super Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
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More detailsPerformance Specification: • Feature Size: < 30 nm • Resolution: < 4 nm • Electron Source: Schottky, Therm Year(s) : 1999 Location : AMERICA North (USA-Canada-Mexico)
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More detailsPerformance Specification: • Feature Size: < 30 nm • Resolution: < 4 nm • Electron Source: Schottky, Therm Year(s) : 2005 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details4400 series sputtering tool Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size: 150mm Location : AMERICA North (USA-Canada-Mexico)
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More detailsMA 150C Mask aligner TSA Top Side Only Wafer Size: 150mm Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details#4 Plasmatherm VLR RIE LM/TM Year(s) : 1996 Location : AMERICA North (USA-Canada-Mexico)
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More detailsKARL SUSS Model: MA 150 MASK ALIGNERS Equipment Details: Mask aligner Power supply: CIC 1000 PC Type: TYAN Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsLaser Identification Systems, Inc. model Wafermark II Vintage May 1984 Year(s) : 1984 Location : AMERICA North (USA-Canada-Mexico)
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More detailsSerial Number: 062207/031291 Wafer Size: 100mm Three track Coat/Develop System Computer operated Track system Location : AMERICA North (USA-Canada-Mexico)
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More detailsSerial Number: 219673 Wafer Size: 200mm RIE system Manual Load lock system Alcatel 600T Turbo pump and co Location : AMERICA North (USA-Canada-Mexico)
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More detailsSerial Number: AK200176 Wafer Size: 200mm MicroTec Delta 20T2 Manual Coat Spinner with Delta 150 VPO Hot plate Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)
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More detailsBackside Laser Ablation Tool Cassette to Cassette YES Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsLaser Wafer ID Marking Tool Cassette to Cassette YES Condition New-Never Used Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsYou can find used Wafer Equipment on Wotol
The main manufacturers of Wafer Equipment are KLA-Tencor, Karl Suss, Canon, Electroglas, Suss, Nikon, Semitool, TEL, Tokyo Semitsu Kogaku (TSK), Branson / IPC, MGI, Ultron, EVG, Allwin21, Abm, Accretech, ADE, AG Associates, AIO, Alessi, Applied Materials, ASM, ASML, Asyst Technologies, ATMI, Axcelis, Brooks Automation, Buehler, Cambridge, Cascade, Cascade Microtech, CDE (Creative Design Engineering), CEE, CHA, Control Micro Systems (CMS), Cymer, Dainippon Screen,Dektak, Denton, Disco, DNK, DNS, Dynapert, Dynatex, Electroglass, EV Group, Evergreen, Faith, Fluoroware, Fortrend Engineering, Gasonics, GCA, GSI Lumonics, Hitachi, HTG, IMT, InspecTech, Ionic Systems, Jeol, K & S, Kensington, KLA, Kokusai, LAM, Lam Research, Leica, Lintec, Loomis, Lumonics, Mactronix, Matsushita, Mech-El, Micro Automation, MRC, MTI, Nanometrics, Nitto, OAI, Olympus, Oriel, Oxford, Perkin Elmer, PRI, Prometrix, Recif SA, Rucker & Kolls, Suss MicroTec, SVG, Takatori, Tegal, Tencor, Tropel, Ultracision, Ultratech, Ulvac, Veeco, Verteq, Wentworth, Xynetics
The main model MPASeries, CDS-650CT, PLA-501F, MA-4100, NSR-1505G4, 1000, Titan II, MA150, 6033, 2029,2020,2025, 6200Series, SM200E, Step 200,UM810, UH-130, UF3000 EX, SFX100, M777, FPA-5500iZa, SR8220-019, Desktop 1, 270 SRD, ST-260, 1600-55, 8100XP, 8100Series, 1H-DX, KP-4200, MA-4201Series, MA-1006, L200,UH130M,DFM-M150, CEE 100, SP323, MJB3Series, JWSSeries, MA6Series, SWC4000, EX-5700, 2001X, MDA-60FA, 680A, 8300, ARM200CF, S-5200, S-4700, AS5000, Axiotron II, INS330, Axiospect 301, SF 600, WaferMark II,3308, MASeries, 20T2/150VPO, 860, 1600-55A, UH 102, 4000, Eureka 450, ETI0392A-6-U, 425130, ETII-6910B-X-V, EET1-0395D-X-U, ETII-6910B-X-V, F-6225, 827, 907, 211,UVSeries, AIT8010, eCD2, 8100XPR, CD-SEMSeries, 8250, PC 4400, 300405, SFS 6420, 6D, MM-Cascade 6100, MJB-55, 179884/ P-2 OPEN FRAME, 8300X, 4500, ATRM-2100, SWC11, MAS-8000,ATM-1100E, 3A, 90, RTP-600xp, UKA-650, SPP8, MP 2300, BH-BHM, 2066,AL100-L8, IDLW8R, REL-4500, IDLW8R, MAS-8000, Fix Load25, UKA-825, SCW111, ATRM-2100D, 4055/2, Optistation 3, REL-4500, ResMap 178, 8097, 1600-55m, LSD 100, DSL 10, H100, RHM-06, 908, UH-130, 600W, 100FX, RS 35, P16+, 8620, MA8/BA8 Gen3, lle-855SS, 85DD, SFS7700, 2300 Versys, ZX-1000, Mark7, S-7800HSA, 5610,ES3, M-GAUGE 200, AITI,SFS7200, THERMA-WAVE OP 2600, MA150, 2115, 9400, NGP80, 620, XRF3640, CTR-200, TREX 610, F-4225, EET10395-4-U, SYO-200SS, MS100, RS-75, 7400/18, 2001X 6, PLA-501FA, PS300 Parametric Serie 12, DX-III, SHS 1000VAC, V300-Si, 12", WM650, AlphaStep 300, SURFSCAN 7700, 903eSeries, F6000QS, SP1 TB1, Nanolab 600, NWL860-TMB-SP, F5, DSS200, RS35C, MX-50, DD-823V-8BL, MicroSense 6300, 2400, 4400,E5200, 8108, 600FA, 40, MRC 603, 7700, VersaPort 2200, R-3, SSEC M10, ST-270 SRD, L3510, HTC 8020, Lumonics III, 1800-6AR, HTC 4000, SSW-60A-AR, 1034X, WST 306, ST-860, KIS 2000, L3510E, 9350, PSM 6, 80B, RS-35, DR-8500 II, 301, VLR RIE LM/TM, 20T2/150VPO, 1034 XA – 6, 4085XSeries, 682A, 500R 120-1007, E8025S, 100 RIE, M6000L, EV CS50, 150, RC8, ATM-105-1-S-CE-S293, MPC3000, DMI4000B, 5100, F5x, P-10, LP-200H, F200, CMS1030, CW1002-6200RW, 8860, APM90A, 3001X, APM5000, 880
HS Code 8486 10 10 for Apparatus for rapid heating of semiconductor wafers.
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devicesde8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices