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Used Wafer Equipment

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Wafer Size 8 Location : ASIA (North East)

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Wafer Size 8 Year(s) : 1996 Location : ASIA (North East)

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S-7800HSA Wafer Size 6,8 Year(s) : 1996 Location : ASIA (North East)

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Wafer Size 8 Year(s) : 2001 Location : ASIA (North East)

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Wafer Size 4,6 Location : ASIA (North East)

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AITI Wafer Size 8 Location : ASIA (North East)

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SFS7200 Wafer Size 6,8 Location : ASIA (North East)

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THERMA-WAVE OP 2600 Year(s) : 1997 Location : ASIA (North East)

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150mm Mask Aligner Location : ASIA (North East)

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150mm has missing parts Location : ASIA (North East)

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100mm Mask Aligner Location : ASIA (North East)

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Max Wafer: 200mm Configuration: Topside Alignment, 350W Lamphouse, UV400 Optics - Topside Alignment - 350W Location : AMERICA North (USA-Canada-Mexico)

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Table top polishing system, automated, 6&8 inch wafers Location : AMERICA North (USA-Canada-Mexico)

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Wafer Mapping Die Sorter Year(s) : 2011 Location : AMERICA North (USA-Canada-Mexico)

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This Electroglas 2001X 6" Wafer Prober looks to be in good cosmetic condition, showing some minor signs of wea Location : AMERICA North (USA-Canada-Mexico)

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- Up to 8"/200mm wafer handling - Allows small batch processing for R&D and Pilot Production - Load-locked Sys Year(s) : 2007 Location : AMERICA North (USA-Canada-Mexico)

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Longdescription: with 6" vacuum Chuck Microscope Ocular: Bausch & Lomb 10 x W.F. Objective: 2,25 x 0,04,8 x 0 Location : EUROPE (Western and Northern)

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SERIAL: 05940331 8" PLATE VOLT: 115 AMP: 4 HZ: 60 USEE 8687 CRATE SIZE: 40X40X42 CRATE WEIGHT: 390 LBS Location : AMERICA North (USA-Canada-Mexico)

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Brand: DNS Model: 80B Year: 1996 DEVELOP TRACK Specifications • Used • Description Develop track • Manufactur Year(s) : 1996 Location : AMERICA North (USA-Canada-Mexico)

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Brand: KLA-Tencor Model: RS-35 RESISTIVITY MAP Specifications - Used - Description Resistivity Map - Configu Location : AMERICA North (USA-Canada-Mexico)

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C90637 Cascade Microtech PS300 Parametric Serie 12" Automatic Wafer Prober Location : AMERICA North (USA-Canada-Mexico)

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Brand: ATMI Model: Ecosys Phoenix Hydrogen Active Flame Thermal Oxidizer Used Details: overall unpacked dim Location : AMERICA North (USA-Canada-Mexico)

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Brand: Dynatex Model: DX-III WAFER SCRIBER BREAKER Specifications - Used - This Wafer Scriber Breaker looks t Location : AMERICA North (USA-Canada-Mexico)

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Brand: Mattson Model: SHS 1000VAC RAPID THERMAL PROCESSOR Specifications - Used - Rapid Thermal Processor (pr Location : AMERICA North (USA-Canada-Mexico)

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ELECTROGLAS 4085X 200mm Automated Prober 200mm Temptronic thermal inducing non-contacting Wafer Chuck Temptro Location : EUROPE (Central and Eastern)

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You can find used Wafer Equipment on Wotol

The main manufacturers of Wafer Equipment are KLA-Tencor, Karl Suss, Canon, Electroglas, Suss, Nikon, Semitool, TEL, Tokyo Semitsu Kogaku (TSK), Branson / IPC, MGI, Ultron, EVG, Allwin21, Abm, Accretech, ADE, AG Associates, AIO, Alessi, Applied Materials, ASM, ASML, Asyst Technologies, ATMI, Axcelis, Brooks Automation, Buehler, Cambridge, Cascade, Cascade Microtech, CDE (Creative Design Engineering), CEE, CHA, Control Micro Systems (CMS), Cymer, Dainippon Screen,Dektak, Denton, Disco, DNK, DNS, Dynapert, Dynatex, Electroglass, EV Group, Evergreen, Faith, Fluoroware, Fortrend Engineering, Gasonics, GCA, GSI Lumonics, Hitachi, HTG, IMT, InspecTech, Ionic Systems, Jeol, K & S, Kensington, KLA, Kokusai, LAM, Lam Research, Leica, Lintec, Loomis, Lumonics, Mactronix, Matsushita, Mech-El, Micro Automation, MRC, MTI, Nanometrics, Nitto, OAI, Olympus, Oriel, Oxford, Perkin Elmer, PRI, Prometrix, Recif SA, Rucker & Kolls, Suss MicroTec, SVG, Takatori, Tegal, Tencor, Tropel, Ultracision, Ultratech, Ulvac, Veeco, Verteq, Wentworth, Xynetics

The main model  MPASeries, CDS-650CT, PLA-501F, MA-4100, NSR-1505G4, 1000, Titan II, MA150,  6033, 2029,2020,2025, 6200Series, SM200E, Step 200,UM810, UH-130, UF3000 EX, SFX100, M777, FPA-5500iZa, SR8220-019, Desktop 1, 270 SRD, ST-260, 1600-55, 8100XP, 8100Series, 1H-DX, KP-4200, MA-4201Series, MA-1006, L200,UH130M,DFM-M150, CEE 100, SP323, MJB3Series, JWSSeries, MA6Series, SWC4000, EX-5700, 2001X, MDA-60FA, 680A, 8300, ARM200CF, S-5200, S-4700, AS5000, Axiotron II, INS330, Axiospect 301, SF 600, WaferMark II,3308, MASeries, 20T2/150VPO, 860, 1600-55A, UH 102, 4000, Eureka 450, ETI0392A-6-U, 425130, ETII-6910B-X-V, EET1-0395D-X-U, ETII-6910B-X-V, F-6225, 827, 907, 211,UVSeries, AIT8010, eCD2, 8100XPR, CD-SEMSeries, 8250, PC 4400, 300405, SFS 6420, 6D, MM-Cascade 6100, MJB-55, 179884/ P-2 OPEN FRAME, 8300X, 4500, ATRM-2100, SWC11, MAS-8000,ATM-1100E, 3A, 90, RTP-600xp, UKA-650, SPP8, MP 2300, BH-BHM, 2066,AL100-L8, IDLW8R, REL-4500, IDLW8R, MAS-8000, Fix Load25, UKA-825, SCW111, ATRM-2100D, 4055/2, Optistation 3, REL-4500, ResMap 178, 8097, 1600-55m, LSD 100, DSL 10, H100, RHM-06, 908, UH-130, 600W, 100FX, RS 35, P16+, 8620, MA8/BA8 Gen3, lle-855SS, 85DD, SFS7700, 2300 Versys, ZX-1000, Mark7, S-7800HSA, 5610,ES3, M-GAUGE 200, AITI,SFS7200, THERMA-WAVE OP 2600, MA150, 2115, 9400, NGP80, 620, XRF3640, CTR-200, TREX 610, F-4225, EET10395-4-U, SYO-200SS, MS100, RS-75, 7400/18, 2001X 6, PLA-501FA, PS300 Parametric Serie 12, DX-III, SHS 1000VAC, V300-Si, 12", WM650, AlphaStep 300, SURFSCAN 7700, 903eSeries, F6000QS, SP1 TB1, Nanolab 600, NWL860-TMB-SP, F5, DSS200, RS35C, MX-50, DD-823V-8BL, MicroSense 6300, 2400, 4400,E5200, 8108, 600FA, 40, MRC 603, 7700, VersaPort 2200, R-3, SSEC M10, ST-270 SRD, L3510, HTC 8020, Lumonics III, 1800-6AR, HTC 4000, SSW-60A-AR, 1034X, WST 306, ST-860, KIS 2000, L3510E, 9350, PSM 6, 80B, RS-35, DR-8500 II, 301, VLR RIE LM/TM, 20T2/150VPO, 1034 XA – 6, 4085XSeries, 682A, 500R 120-1007, E8025S, 100 RIE, M6000L, EV CS50, 150, RC8, ATM-105-1-S-CE-S293, MPC3000, DMI4000B, 5100, F5x, P-10, LP-200H, F200, CMS1030, CW1002-6200RW, 8860, APM90A, 3001X, APM5000, 880

HS Code 8486 10 10 for Apparatus for rapid heating of semiconductor wafers. 
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devicesde8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices

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