Used Wafer Equipment
366 resultsKarl Suss MJB 55 Aligners (MJB 55) Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsQuintel 4" Aligner * Sized for 4" wafers. Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPerkin Elmer 341 Mask Aligners (341) Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPerkin Elmer 340 Mask Aligners (340) Inventory Number: 60 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsPerkin Elmer 300 Capable of 3" to 5" wafers. 80 wafers per hour throughput. Enhanced high performance conden Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsKarl Suss MJB-3 Aligners (MJB-3 mask Aligner) - 3" dia. or partial wafers. - Single Field Microscope. - NPL Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsKarl Suss MA 8 Mask Aligner (Kalr Suss MA 8) Inventory Number: 51723 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsCanon PLA 600-FA Mask Aligner * Capable of cassette to cassette mask aligner * Run in manually or in auto mod Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsKarl Suss MA 4/6 (MA 4/6) 4" GaAs Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsKarl Suss MA 56 Mask Aligner * Capable of manual, semiautomatic, or fully automatic exposure. * Contains Kar Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsKarl Suss MA 150 Aligner (MA 150) UV 400 w/Diffraction Reducing Optics, With 1000Watt Lamphouse Wafer Size U Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsCanon PLA 501FA Mask Aligner * Capable of cassette to cassette mask aligner * Run in manually or in auto mode Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsCanon PLA 501 Mask Aligner * Capable of cassette to cassette mask aligner * Run in manually or in auto mode. Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSERIAL: 05940331 8" PLATE VOLT: 115 AMP: 4 HZ: 60 USEE 8687 CRATE SIZE: 40X40X42 CRATE WEIGHT: 390 LBS Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsTable top polishing system, automated, 6&8 inch wafers Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Mapping Die Sorter Year(s) : 2011 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSpecifications: • Bench top programmable accurate thickness and thickness variation (TTV) measurement system Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsFeatures: RF etch DC and RF deposition stations PE 2KW RF power supply AE MDX DC P/S Digit Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsFeatures: 3 source system 2/Deposition and 1/RF DC bias Main processing system with load lock Capa Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsFeatures: 10x objectives 1000-watt lamphouse UV 400 diffraction reducing optics 365nm/405nm in Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSpecifications: For wafers from 2" to 6" or substrates from 3" x 3" up to 6"6" Fiber optics tube: 2 ar Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSpecifications: UV broadband (250nm-450nm), I-line (365nm) and G-line (436nm) wavelength available. Contac Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSpecifications: System capable of 3" to 5" Cassette to Cassette 350 W Lamp UV-400 Exposure op Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsFeatures: Accommodates wafers up to 8" 2 channel brightfield microscope Three position turret nos Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsFeatures: Capable of wafers up to 8"/200mm Capable of working with wafer masks up to 9" x 9" Autom Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsYou can find used Wafer Equipment on Wotol
The main manufacturers of Wafer Equipment are KLA-Tencor, Karl Suss, Canon, Electroglas, Suss, Nikon, Semitool, TEL, Tokyo Semitsu Kogaku (TSK), Branson / IPC, MGI, Ultron, EVG, Allwin21, Abm, Accretech, ADE, AG Associates, AIO, Alessi, Applied Materials, ASM, ASML, Asyst Technologies, ATMI, Axcelis, Brooks Automation, Buehler, Cambridge, Cascade, Cascade Microtech, CDE (Creative Design Engineering), CEE, CHA, Control Micro Systems (CMS), Cymer, Dainippon Screen,Dektak, Denton, Disco, DNK, DNS, Dynapert, Dynatex, Electroglass, EV Group, Evergreen, Faith, Fluoroware, Fortrend Engineering, Gasonics, GCA, GSI Lumonics, Hitachi, HTG, IMT, InspecTech, Ionic Systems, Jeol, K & S, Kensington, KLA, Kokusai, LAM, Lam Research, Leica, Lintec, Loomis, Lumonics, Mactronix, Matsushita, Mech-El, Micro Automation, MRC, MTI, Nanometrics, Nitto, OAI, Olympus, Oriel, Oxford, Perkin Elmer, PRI, Prometrix, Recif SA, Rucker & Kolls, Suss MicroTec, SVG, Takatori, Tegal, Tencor, Tropel, Ultracision, Ultratech, Ulvac, Veeco, Verteq, Wentworth, Xynetics
The main model MPASeries, CDS-650CT, PLA-501F, MA-4100, NSR-1505G4, 1000, Titan II, MA150, 6033, 2029,2020,2025, 6200Series, SM200E, Step 200,UM810, UH-130, UF3000 EX, SFX100, M777, FPA-5500iZa, SR8220-019, Desktop 1, 270 SRD, ST-260, 1600-55, 8100XP, 8100Series, 1H-DX, KP-4200, MA-4201Series, MA-1006, L200,UH130M,DFM-M150, CEE 100, SP323, MJB3Series, JWSSeries, MA6Series, SWC4000, EX-5700, 2001X, MDA-60FA, 680A, 8300, ARM200CF, S-5200, S-4700, AS5000, Axiotron II, INS330, Axiospect 301, SF 600, WaferMark II,3308, MASeries, 20T2/150VPO, 860, 1600-55A, UH 102, 4000, Eureka 450, ETI0392A-6-U, 425130, ETII-6910B-X-V, EET1-0395D-X-U, ETII-6910B-X-V, F-6225, 827, 907, 211,UVSeries, AIT8010, eCD2, 8100XPR, CD-SEMSeries, 8250, PC 4400, 300405, SFS 6420, 6D, MM-Cascade 6100, MJB-55, 179884/ P-2 OPEN FRAME, 8300X, 4500, ATRM-2100, SWC11, MAS-8000,ATM-1100E, 3A, 90, RTP-600xp, UKA-650, SPP8, MP 2300, BH-BHM, 2066,AL100-L8, IDLW8R, REL-4500, IDLW8R, MAS-8000, Fix Load25, UKA-825, SCW111, ATRM-2100D, 4055/2, Optistation 3, REL-4500, ResMap 178, 8097, 1600-55m, LSD 100, DSL 10, H100, RHM-06, 908, UH-130, 600W, 100FX, RS 35, P16+, 8620, MA8/BA8 Gen3, lle-855SS, 85DD, SFS7700, 2300 Versys, ZX-1000, Mark7, S-7800HSA, 5610,ES3, M-GAUGE 200, AITI,SFS7200, THERMA-WAVE OP 2600, MA150, 2115, 9400, NGP80, 620, XRF3640, CTR-200, TREX 610, F-4225, EET10395-4-U, SYO-200SS, MS100, RS-75, 7400/18, 2001X 6, PLA-501FA, PS300 Parametric Serie 12, DX-III, SHS 1000VAC, V300-Si, 12", WM650, AlphaStep 300, SURFSCAN 7700, 903eSeries, F6000QS, SP1 TB1, Nanolab 600, NWL860-TMB-SP, F5, DSS200, RS35C, MX-50, DD-823V-8BL, MicroSense 6300, 2400, 4400,E5200, 8108, 600FA, 40, MRC 603, 7700, VersaPort 2200, R-3, SSEC M10, ST-270 SRD, L3510, HTC 8020, Lumonics III, 1800-6AR, HTC 4000, SSW-60A-AR, 1034X, WST 306, ST-860, KIS 2000, L3510E, 9350, PSM 6, 80B, RS-35, DR-8500 II, 301, VLR RIE LM/TM, 20T2/150VPO, 1034 XA – 6, 4085XSeries, 682A, 500R 120-1007, E8025S, 100 RIE, M6000L, EV CS50, 150, RC8, ATM-105-1-S-CE-S293, MPC3000, DMI4000B, 5100, F5x, P-10, LP-200H, F200, CMS1030, CW1002-6200RW, 8860, APM90A, 3001X, APM5000, 880
HS Code 8486 10 10 for Apparatus for rapid heating of semiconductor wafers.
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devicesde8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices