Used Wafer Equipment
450 resultsExposure on 300mm wafers or 12×12″ substrates with up to 1 micron resolution 2000 watt power supply and lamp M Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSTYLUS TYPE PROFILOMETER FOR MEASURING STEPS ON UP TO 6" WAFERS 360 DEGREE STAGE ROTATION 100 ANGSTROM TO 1310 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWAFER TESTER FOR WAFER THICKNESS INCLUDES LARGE ANVIL STYLE TABLE TO HOLD SMALL OR LARGE SUBSTRATES Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsFOR MEASURING DIELECTRIC THIN FILMS ON WAFERS UP TO 8" DIAMETER INCLUDES COMPUTER WITH MAPPING Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsStepper Wafer Size 200MM Year(s) : 1997 Location : ASIA (North East)
Price : On request
More detailsWafer Size 300MM Year(s) : 2004 Location : ASIA (North East)
Price : On request
More detailsFully Automatic 300mm wafer prober, Dual FIMS loadport, Cold (-25c, ambiant and hot) Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsRTP: Laser Annealing System/6in. Year(s) : 2019 Location : ASIA (North East)
Price : On request
More detailsfur: Diffusion Furnace (Wet Oxide)/6in. Location : ASIA (North East)
Price : On request
More detailsScia Ion Mill 200 Ion consisting of: - Model: Ion Mill 200 - Vintage: Approximately 2019 - Used Minimall Year(s) : 2019 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsAPPLIED MATERIALS AMAT 5500 ENDURA PVD consisting of: - Model: 5500 Endura - 2 DPS / DTM Chambers - Ebara Syst Year(s) : 2019 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsAPPLIED MATERIALS AMAT 5200 CENTURA II consisting of: - Model: 5200 Centura II - 2 DPS / DTM Chambers - SBC Sy Year(s) : 2019 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSuss MicroTec Gen3 ACS200 consisting of: - Model: ACS200 (Gen3) - Currently Configured for Edge Handling - C Year(s) : 2019 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsTube Material: Quartz Boat Material: Quartz Production wafeRs: 50 Pressure control: APC Valve Process Gas: T Year(s) : 2015 Location : EUROPE (Western and Northern)
Price : On request
More details300mm Year(s) : 2012 Location : EUROPE (Western and Northern)
Price : On request
More detailsA large-batch platform for LPCVD oxidation, annealing, and deposition designed to maximize wafer yield per squ Year(s) : 2006 Location : EUROPE (Western and Northern)
Price : On request
More details13873 Wafer Mounter Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsM-2010 Wafer Washer Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsORIEL 87331 Mask Aligner Exposure Light 13157 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer inspection Year(s) : 2008 Location : ASIA (North East)
Price : On request
More detailsTEL ACT 8 COATER/DEVELOPER consisting of: - Model: CLEAN TRACK ACT 8 - Dual Block - Set up for 6” Wafers - 4 C Year(s) : 2020 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSOG Coater. Tool status: connected Wafer size: 200mm Fab section: thin film Vintage: 1998 Asset description: T Year(s) : 1998 Location : EUROPE (Western and Northern)
Price : On request
More detailsWAFER MOUNTER Vintage: 2020 Year(s) : 2020 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer Clean 300mm Less than 200hrs Year(s) : 2017 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer Sizes: 12"/300mm IMPLANT MC The VIISta 810 HP provides precise total incident angle and dosimetry contr Year(s) : 2018 Location : EUROPE (Western and Northern)
Price : On request
More detailsYou can find used Wafer Equipment on Wotol
The main manufacturers of Wafer Equipment are KLA-Tencor, Karl Suss, Canon, Electroglas, Suss, Nikon, Semitool, TEL, Tokyo Semitsu Kogaku (TSK), Branson / IPC, MGI, Ultron, EVG, Allwin21, Abm, Accretech, ADE, AG Associates, AIO, Alessi, Applied Materials, ASM, ASML, Asyst Technologies, ATMI, Axcelis, Brooks Automation, Buehler, Cambridge, Cascade, Cascade Microtech, CDE (Creative Design Engineering), CEE, CHA, Control Micro Systems (CMS), Cymer, Dainippon Screen,Dektak, Denton, Disco, DNK, DNS, Dynapert, Dynatex, Electroglass, EV Group, Evergreen, Faith, Fluoroware, Fortrend Engineering, Gasonics, GCA, GSI Lumonics, Hitachi, HTG, IMT, InspecTech, Ionic Systems, Jeol, K & S, Kensington, KLA, Kokusai, LAM, Lam Research, Leica, Lintec, Loomis, Lumonics, Mactronix, Matsushita, Mech-El, Micro Automation, MRC, MTI, Nanometrics, Nitto, OAI, Olympus, Oriel, Oxford, Perkin Elmer, PRI, Prometrix, Recif SA, Rucker & Kolls, Suss MicroTec, SVG, Takatori, Tegal, Tencor, Tropel, Ultracision, Ultratech, Ulvac, Veeco, Verteq, Wentworth, Xynetics
The main model MPASeries, CDS-650CT, PLA-501F, MA-4100, NSR-1505G4, 1000, Titan II, MA150, 6033, 2029,2020,2025, 6200Series, SM200E, Step 200,UM810, UH-130, UF3000 EX, SFX100, M777, FPA-5500iZa, SR8220-019, Desktop 1, 270 SRD, ST-260, 1600-55, 8100XP, 8100Series, 1H-DX, KP-4200, MA-4201Series, MA-1006, L200,UH130M,DFM-M150, CEE 100, SP323, MJB3Series, JWSSeries, MA6Series, SWC4000, EX-5700, 2001X, MDA-60FA, 680A, 8300, ARM200CF, S-5200, S-4700, AS5000, Axiotron II, INS330, Axiospect 301, SF 600, WaferMark II,3308, MASeries, 20T2/150VPO, 860, 1600-55A, UH 102, 4000, Eureka 450, ETI0392A-6-U, 425130, ETII-6910B-X-V, EET1-0395D-X-U, ETII-6910B-X-V, F-6225, 827, 907, 211,UVSeries, AIT8010, eCD2, 8100XPR, CD-SEMSeries, 8250, PC 4400, 300405, SFS 6420, 6D, MM-Cascade 6100, MJB-55, 179884/ P-2 OPEN FRAME, 8300X, 4500, ATRM-2100, SWC11, MAS-8000,ATM-1100E, 3A, 90, RTP-600xp, UKA-650, SPP8, MP 2300, BH-BHM, 2066,AL100-L8, IDLW8R, REL-4500, IDLW8R, MAS-8000, Fix Load25, UKA-825, SCW111, ATRM-2100D, 4055/2, Optistation 3, REL-4500, ResMap 178, 8097, 1600-55m, LSD 100, DSL 10, H100, RHM-06, 908, UH-130, 600W, 100FX, RS 35, P16+, 8620, MA8/BA8 Gen3, lle-855SS, 85DD, SFS7700, 2300 Versys, ZX-1000, Mark7, S-7800HSA, 5610,ES3, M-GAUGE 200, AITI,SFS7200, THERMA-WAVE OP 2600, MA150, 2115, 9400, NGP80, 620, XRF3640, CTR-200, TREX 610, F-4225, EET10395-4-U, SYO-200SS, MS100, RS-75, 7400/18, 2001X 6, PLA-501FA, PS300 Parametric Serie 12, DX-III, SHS 1000VAC, V300-Si, 12", WM650, AlphaStep 300, SURFSCAN 7700, 903eSeries, F6000QS, SP1 TB1, Nanolab 600, NWL860-TMB-SP, F5, DSS200, RS35C, MX-50, DD-823V-8BL, MicroSense 6300, 2400, 4400,E5200, 8108, 600FA, 40, MRC 603, 7700, VersaPort 2200, R-3, SSEC M10, ST-270 SRD, L3510, HTC 8020, Lumonics III, 1800-6AR, HTC 4000, SSW-60A-AR, 1034X, WST 306, ST-860, KIS 2000, L3510E, 9350, PSM 6, 80B, RS-35, DR-8500 II, 301, VLR RIE LM/TM, 20T2/150VPO, 1034 XA – 6, 4085XSeries, 682A, 500R 120-1007, E8025S, 100 RIE, M6000L, EV CS50, 150, RC8, ATM-105-1-S-CE-S293, MPC3000, DMI4000B, 5100, F5x, P-10, LP-200H, F200, CMS1030, CW1002-6200RW, 8860, APM90A, 3001X, APM5000, 880
HS Code 8486 10 10 for Apparatus for rapid heating of semiconductor wafers.
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devicesde8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices