Used Wafer Equipment
418 resultsHorizontal spin axis, for up to 6″ wafers Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsAligner/Mask Location : ASIA (North East)
Price : On request
More detailsMicroscope Configuration Brightfield, Darkfield & DIC Illumination Type Reflected Light Eyepieces Model Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSussMicrotec Mask Aligner MA 150e Remanufactured Automatic Mask Aligner System, Configuration: Suss MA 100/15 Year(s) : 2010 Location : EUROPE (Western and Northern)
Price : On request
More detailsRHM-06 probe station 6″ wafer chuck, 6×6″ travel Calibrated B&L zoom 7 optics Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsMask and Wafer Inspection Loadport : 300mm x 2 Sets DualFIMS Working Condition. Wafer : 300 mm Complete. Year(s) : 2007 Location : ASIA (North East)
Price : On request
More detailsCleaning machine/Wafer Location : ASIA (North East)
Price : On request
More detailsF-REX300, 300 mm, Cu CMP Polish Tool ID: ED05 Year(s) : 2002 Location : EUROPE (Western and Northern)
Price : On request
More detailsSingle Wafer Process Single Rotometer Controlled Gas Channel Multi-Step Process Cycle Capability P Year(s) : 1987 Location : EUROPE (Western and Northern)
Price : On request
More detailsES 3CH / INT340, Tool ID: PSX4603 Year(s) : 2011 Location : EUROPE (Western and Northern)
Price : On request
More detailsACT12, 300mm Will be going to warehouse in May 2023. Tool ID: LATK701 Year(s) : 2004 Location : EUROPE (Western and Northern)
Price : On request
More detailsMicroscope Type Compound Multiple Objectives Models American Optical Microscope Objectives: 4/.12 Plan ach Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size Range Maximum 150 mm Microscope Type Microzoom X-Y Optics Motion YES Vacuum Chuck Diamet Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsMask Aligner is 7″ in diameter lens includes microscope (not shown) and 350 watt lamp. Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsInnolas Wafermarker Wafermarker C3000DPS Marking for 300mm Wafers Wafer Size Range Minimum 200 mm Maximum 3 Year(s) : 2002 Location : EUROPE (Western and Northern)
Price : On request
More detailseS32 e-beam wafer inspection 200mm Condition Fair Serial Number(s) 2032 Year(s) : 2006 Location : EUROPE (Western and Northern)
Price : On request
More detailsDetails: - Semi-Automated Spray Solvent Tool (SST) - Batch Solvent Processor for Wafer Cleaning - Max Substrat Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsDescription: Other Information Wafer Size: 4 to 8" Tape Tension: Programmable Cycle Time: 30 seconds for a 6 Year(s) : 1999 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsUser Manual available Location : EUROPE (Western and Northern)
Price : On request
More detailsExSolve CLM next Gen, 300mm Microscope Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details382 AUTO FILM FRAME MOUNTER (BONDER) INCLUDES QTY 25 6″ FILM FRAMES Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsManual Aligner Year(s) : 2007 Location : ASIA (North East)
Price : On request
More detailsAlpha Step IQ Year(s) : 2013 Location : ASIA (North East)
Price : On request
More detailsWafer Size Range Minimum 50 mm Maximum 100 mm Set Size 100 mm Other Information Chucks:2"-3"-4" Po Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer Size Range Minimum 50 mm Maximum 200 mm Set Size 100 mm Mask Plate Size 5'' x 5'' Alignment Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsYou can find used Wafer Equipment on Wotol
The main manufacturers of Wafer Equipment are KLA-Tencor, Karl Suss, Canon, Electroglas, Suss, Nikon, Semitool, TEL, Tokyo Semitsu Kogaku (TSK), Branson / IPC, MGI, Ultron, EVG, Allwin21, Abm, Accretech, ADE, AG Associates, AIO, Alessi, Applied Materials, ASM, ASML, Asyst Technologies, ATMI, Axcelis, Brooks Automation, Buehler, Cambridge, Cascade, Cascade Microtech, CDE (Creative Design Engineering), CEE, CHA, Control Micro Systems (CMS), Cymer, Dainippon Screen,Dektak, Denton, Disco, DNK, DNS, Dynapert, Dynatex, Electroglass, EV Group, Evergreen, Faith, Fluoroware, Fortrend Engineering, Gasonics, GCA, GSI Lumonics, Hitachi, HTG, IMT, InspecTech, Ionic Systems, Jeol, K & S, Kensington, KLA, Kokusai, LAM, Lam Research, Leica, Lintec, Loomis, Lumonics, Mactronix, Matsushita, Mech-El, Micro Automation, MRC, MTI, Nanometrics, Nitto, OAI, Olympus, Oriel, Oxford, Perkin Elmer, PRI, Prometrix, Recif SA, Rucker & Kolls, Suss MicroTec, SVG, Takatori, Tegal, Tencor, Tropel, Ultracision, Ultratech, Ulvac, Veeco, Verteq, Wentworth, Xynetics
The main model MPASeries, CDS-650CT, PLA-501F, MA-4100, NSR-1505G4, 1000, Titan II, MA150, 6033, 2029,2020,2025, 6200Series, SM200E, Step 200,UM810, UH-130, UF3000 EX, SFX100, M777, FPA-5500iZa, SR8220-019, Desktop 1, 270 SRD, ST-260, 1600-55, 8100XP, 8100Series, 1H-DX, KP-4200, MA-4201Series, MA-1006, L200,UH130M,DFM-M150, CEE 100, SP323, MJB3Series, JWSSeries, MA6Series, SWC4000, EX-5700, 2001X, MDA-60FA, 680A, 8300, ARM200CF, S-5200, S-4700, AS5000, Axiotron II, INS330, Axiospect 301, SF 600, WaferMark II,3308, MASeries, 20T2/150VPO, 860, 1600-55A, UH 102, 4000, Eureka 450, ETI0392A-6-U, 425130, ETII-6910B-X-V, EET1-0395D-X-U, ETII-6910B-X-V, F-6225, 827, 907, 211,UVSeries, AIT8010, eCD2, 8100XPR, CD-SEMSeries, 8250, PC 4400, 300405, SFS 6420, 6D, MM-Cascade 6100, MJB-55, 179884/ P-2 OPEN FRAME, 8300X, 4500, ATRM-2100, SWC11, MAS-8000,ATM-1100E, 3A, 90, RTP-600xp, UKA-650, SPP8, MP 2300, BH-BHM, 2066,AL100-L8, IDLW8R, REL-4500, IDLW8R, MAS-8000, Fix Load25, UKA-825, SCW111, ATRM-2100D, 4055/2, Optistation 3, REL-4500, ResMap 178, 8097, 1600-55m, LSD 100, DSL 10, H100, RHM-06, 908, UH-130, 600W, 100FX, RS 35, P16+, 8620, MA8/BA8 Gen3, lle-855SS, 85DD, SFS7700, 2300 Versys, ZX-1000, Mark7, S-7800HSA, 5610,ES3, M-GAUGE 200, AITI,SFS7200, THERMA-WAVE OP 2600, MA150, 2115, 9400, NGP80, 620, XRF3640, CTR-200, TREX 610, F-4225, EET10395-4-U, SYO-200SS, MS100, RS-75, 7400/18, 2001X 6, PLA-501FA, PS300 Parametric Serie 12, DX-III, SHS 1000VAC, V300-Si, 12", WM650, AlphaStep 300, SURFSCAN 7700, 903eSeries, F6000QS, SP1 TB1, Nanolab 600, NWL860-TMB-SP, F5, DSS200, RS35C, MX-50, DD-823V-8BL, MicroSense 6300, 2400, 4400,E5200, 8108, 600FA, 40, MRC 603, 7700, VersaPort 2200, R-3, SSEC M10, ST-270 SRD, L3510, HTC 8020, Lumonics III, 1800-6AR, HTC 4000, SSW-60A-AR, 1034X, WST 306, ST-860, KIS 2000, L3510E, 9350, PSM 6, 80B, RS-35, DR-8500 II, 301, VLR RIE LM/TM, 20T2/150VPO, 1034 XA – 6, 4085XSeries, 682A, 500R 120-1007, E8025S, 100 RIE, M6000L, EV CS50, 150, RC8, ATM-105-1-S-CE-S293, MPC3000, DMI4000B, 5100, F5x, P-10, LP-200H, F200, CMS1030, CW1002-6200RW, 8860, APM90A, 3001X, APM5000, 880
HS Code 8486 10 10 for Apparatus for rapid heating of semiconductor wafers.
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devicesde8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices