Used Wafer Equipment
454 resultsOEM Group 470S SRD High Performance Spin Rinse Dryer Wafer Cleaner. The SRD is a 25 wafer, batch size, single Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSemitool STI 870 Spin Rinser Dryer Double Stack. 6” Wafer Rotor in the top spinner and a 4" Rotor in the bott Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsGrinder Heavy smoker DTU 150 Chiller DVC 010 Vacuum coolant unit Air supply source: Pressure: 0.5-0.8 MPa Location : ASIA (South East)
Price : On request
More details• Wafer Size Capability: 5 – 8 inch • Version: 150 mm • Beam Energy: Up to 200 keV • Dose Range: 1×10¹⁰ – 1×10 Year(s) : 2006 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details• Wafer Size: 200 mm • Chuck Type: Temperature controlled (no chiller or controller included) • Microscope: Mi Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details• Type: Rapid Thermal Processing System • Wafer Sizes: Small pieces, 2", 3", 4", 5", 6", 8" (currently configu Year(s) : 2021 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details• Type: Manual probe station • Optics: B&L stereo zoom 4 • Optional upgrade: Zoom 5 (+$100), Zoom 7 (+$400) • Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details• Wafer size: 4″ • Optics: Mitutoyo high-power microscope with Microzoom optics • Objectives: 2 included • Chu Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsUsed <b> Manufacture : AG Association Model : Heatpulse AG210M </b> Details: Wafer Size : 4" Annealing Chamber Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details<b>Manufacture : Tegal Model : 903e <b>Specification:</b> used Application : Oxide Wafer Size : 6" Operatio Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details- Routinely measures step heights and surface profiles below 200A - A single button automatically initiates sc Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsSingle Rinse/Dryer w/ TC20, 328 controller S/N C8249 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailswafer Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size: 150mm Location : AMERICA North (USA-Canada-Mexico)
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More detailswafer size: 4/5/6/8 inch Applicable wafer thickness: 300-1000um Power supply: 110V fully refurbished, all func Location : ASIA (China - Taiwan - HKG)
Price : On request
More detailswafer 200mm as-is complete working condition Location : ASIA (China - Taiwan - HKG)
Price : On request
More detailsOnly the Laser system, deinstall from ASML Twincan XT1250B ARF Scanner Year(s) : 2004 Location : ASIA (China - Taiwan - HKG)
Price : On request
More detailswafer 200mm as-is complete working condition Location : ASIA (China - Taiwan - HKG)
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More detailsJWS 7555S Year(s) : 2001 Location : ASIA (China - Taiwan - HKG)
Price : On request
More detailsCanon FPA- 5500iZ+ Wafer Size Range Minimum 300 mm Maximum 300 mm Set Size 300 mm Other Information Year(s) : 2004 Location : EUROPE (Western and Northern)
Price : On request
More detailsGeneral Configuration: FPA 3000 - i5(+) Manufactured in June / 1997 8“ Wafer Chuck, Notch PA unit 6“ Nikon-ty Year(s) : 1997 Location : EUROPE (Western and Northern)
Price : On request
More detailsLongdescription: with 6" vacuum Chuck Microscope Ocular: Bausch & Lomb 10 x W.F. Objective: 2,25 x 0,04,8 x 0 Location : EUROPE (Western and Northern)
Price : On request
More detailsMax Wafer: 200mm System Dimensions: 30x40x66 Weight: 695 lbs - Automatic Surface Inspection System - Bare W Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsFilm/Wafer Mounters Accessories Monitor Condition Good Year(s) : 2007 Location : EUROPE (Western and Northern)
Price : On request
More details- Up to 8"/200mm wafer handling - Allows small batch processing for R&D and Pilot Production - Load-locked Sys Year(s) : 2007 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsYou can find used Wafer Equipment on Wotol
The main manufacturers of Wafer Equipment are KLA-Tencor, Karl Suss, Canon, Electroglas, Suss, Nikon, Semitool, TEL, Tokyo Semitsu Kogaku (TSK), Branson / IPC, MGI, Ultron, EVG, Allwin21, Abm, Accretech, ADE, AG Associates, AIO, Alessi, Applied Materials, ASM, ASML, Asyst Technologies, ATMI, Axcelis, Brooks Automation, Buehler, Cambridge, Cascade, Cascade Microtech, CDE (Creative Design Engineering), CEE, CHA, Control Micro Systems (CMS), Cymer, Dainippon Screen,Dektak, Denton, Disco, DNK, DNS, Dynapert, Dynatex, Electroglass, EV Group, Evergreen, Faith, Fluoroware, Fortrend Engineering, Gasonics, GCA, GSI Lumonics, Hitachi, HTG, IMT, InspecTech, Ionic Systems, Jeol, K & S, Kensington, KLA, Kokusai, LAM, Lam Research, Leica, Lintec, Loomis, Lumonics, Mactronix, Matsushita, Mech-El, Micro Automation, MRC, MTI, Nanometrics, Nitto, OAI, Olympus, Oriel, Oxford, Perkin Elmer, PRI, Prometrix, Recif SA, Rucker & Kolls, Suss MicroTec, SVG, Takatori, Tegal, Tencor, Tropel, Ultracision, Ultratech, Ulvac, Veeco, Verteq, Wentworth, Xynetics
The main model MPASeries, CDS-650CT, PLA-501F, MA-4100, NSR-1505G4, 1000, Titan II, MA150, 6033, 2029,2020,2025, 6200Series, SM200E, Step 200,UM810, UH-130, UF3000 EX, SFX100, M777, FPA-5500iZa, SR8220-019, Desktop 1, 270 SRD, ST-260, 1600-55, 8100XP, 8100Series, 1H-DX, KP-4200, MA-4201Series, MA-1006, L200,UH130M,DFM-M150, CEE 100, SP323, MJB3Series, JWSSeries, MA6Series, SWC4000, EX-5700, 2001X, MDA-60FA, 680A, 8300, ARM200CF, S-5200, S-4700, AS5000, Axiotron II, INS330, Axiospect 301, SF 600, WaferMark II,3308, MASeries, 20T2/150VPO, 860, 1600-55A, UH 102, 4000, Eureka 450, ETI0392A-6-U, 425130, ETII-6910B-X-V, EET1-0395D-X-U, ETII-6910B-X-V, F-6225, 827, 907, 211,UVSeries, AIT8010, eCD2, 8100XPR, CD-SEMSeries, 8250, PC 4400, 300405, SFS 6420, 6D, MM-Cascade 6100, MJB-55, 179884/ P-2 OPEN FRAME, 8300X, 4500, ATRM-2100, SWC11, MAS-8000,ATM-1100E, 3A, 90, RTP-600xp, UKA-650, SPP8, MP 2300, BH-BHM, 2066,AL100-L8, IDLW8R, REL-4500, IDLW8R, MAS-8000, Fix Load25, UKA-825, SCW111, ATRM-2100D, 4055/2, Optistation 3, REL-4500, ResMap 178, 8097, 1600-55m, LSD 100, DSL 10, H100, RHM-06, 908, UH-130, 600W, 100FX, RS 35, P16+, 8620, MA8/BA8 Gen3, lle-855SS, 85DD, SFS7700, 2300 Versys, ZX-1000, Mark7, S-7800HSA, 5610,ES3, M-GAUGE 200, AITI,SFS7200, THERMA-WAVE OP 2600, MA150, 2115, 9400, NGP80, 620, XRF3640, CTR-200, TREX 610, F-4225, EET10395-4-U, SYO-200SS, MS100, RS-75, 7400/18, 2001X 6, PLA-501FA, PS300 Parametric Serie 12, DX-III, SHS 1000VAC, V300-Si, 12", WM650, AlphaStep 300, SURFSCAN 7700, 903eSeries, F6000QS, SP1 TB1, Nanolab 600, NWL860-TMB-SP, F5, DSS200, RS35C, MX-50, DD-823V-8BL, MicroSense 6300, 2400, 4400,E5200, 8108, 600FA, 40, MRC 603, 7700, VersaPort 2200, R-3, SSEC M10, ST-270 SRD, L3510, HTC 8020, Lumonics III, 1800-6AR, HTC 4000, SSW-60A-AR, 1034X, WST 306, ST-860, KIS 2000, L3510E, 9350, PSM 6, 80B, RS-35, DR-8500 II, 301, VLR RIE LM/TM, 20T2/150VPO, 1034 XA – 6, 4085XSeries, 682A, 500R 120-1007, E8025S, 100 RIE, M6000L, EV CS50, 150, RC8, ATM-105-1-S-CE-S293, MPC3000, DMI4000B, 5100, F5x, P-10, LP-200H, F200, CMS1030, CW1002-6200RW, 8860, APM90A, 3001X, APM5000, 880
HS Code 8486 10 10 for Apparatus for rapid heating of semiconductor wafers.
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devicesde8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices