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Used Wafer Equipment

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1

300mm Year(s) : 2002 Location : EUROPE (Western and Northern)

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Version: 200 mm Vintage: 01.06.2005 WaferStorm Wet Processing Platform The WaferStorm platform is the indus Year(s) : 2005 Location : AMERICA North (USA-Canada-Mexico)

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Aligner: Semi-Automated Bottom Sude Mask Aligner Year(s) : 2017 Location : ASIA (North East)

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1000 WATT POWER SUPPLY 1 MICRON RESOLUTION ON 6″ WAFERS SPLIT FIELD MICROSCOPE WITH 6 OBJECTIVES Similar to K& Location : AMERICA North (USA-Canada-Mexico)

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2” to 6” (dia.) Wafer Capability Sheet Resistance Range: 1.1 mΩ/sq to 450 KΩ/sq Slice Resistivity Range: 4.19 Location : AMERICA North (USA-Canada-Mexico)

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Manufacturer: Bondztek Model: Bondztek Wafer Mount Wafer Ring Mounter to foton ring Location : EUROPE (Western and Northern)

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300mm Prober single foup VIP3A Tool ID: 33B4WA Year(s) : 2004 Location : United States (USA)

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Description: Exhaust management gas scrubber BOC EDWARDS BOC EDWARDS Longdescription: Equipment Details: Ex Year(s) : 2004 Location : EUROPE (Western and Northern)

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Wafer Inspection Microscope Version: 300 mm Year(s) : 2011 Location : AMERICA North (USA-Canada-Mexico)

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- 8" Configured (can change to 6") - Quartz plasma tube and baffles - ASTEX Microwave 1.2kw - Temperature Cont Location : ASIA (North East)

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Configuration: Configured as shown in pictures. Details coming soon ! Tester interface is not included. Teste Year(s) : 2005 Location : AMERICA North (USA-Canada-Mexico)

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Microscope Type Upright Microscope Configuration Brightfield, Darkfield & DIC Illumination Type Reflected L Location : AMERICA North (USA-Canada-Mexico)

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Exterior Dimensions Width 40.157 in (102.0 cm) Depth 44.094 in (112.0 cm) Height 59.055 in (1 Year(s) : 2017 Location : EUROPE (Western and Northern)

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[ General Description ] Wafer Size : 2 ~8 inch Illumination Source : 8mW laser, 635 nm wavelength Operator Int Year(s) : 2006 Location : ASIA (North East)

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Backside Laser Ablation Tool Cassette to Cassette YES Location : AMERICA North (USA-Canada-Mexico)

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Laser Wafer ID Marking Tool Cassette to Cassette YES Condition New-Never Used Location : AMERICA North (USA-Canada-Mexico)

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- SN: 0396 - Genmark Gencobot 8/3L Handler - Thermo Scientific A40 Chiller with PC 200 Immersion Circulator Location : AMERICA North (USA-Canada-Mexico)

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Capable up to 12" Wafer ■ SSM 52 Capacitance Measurement Unit ■ Motor control unit ■ Pneumatic control Unit ■ Year(s) : 2010 Location : ASIA (North East)

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QUINTEL 7000 HIGH RESOLUTION MASK ALIGNER CURRENTLY CONFIGURED FOR 4″ DIAMETER (WILL EXPOSE LARGER PARTS) WITH Location : AMERICA North (USA-Canada-Mexico)

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Description: -Mask Aligner Karl Suss MA 45 (refurbished by expert), TSA, up to 4” Wafer or SubstrateMA45 Mask Location : EUROPE (Western and Northern)

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UPGRADED COBILT CA 800, SET UP FOR 2″, 3″ OR 4″ WAFERS INCLUDES SPLIT FEILD OPTICS, 2 TO 3 MICRON RESOLUTION Location : AMERICA North (USA-Canada-Mexico)

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- Thermo Scientific A25 Chiller - Neslab RTE-221 Chiller - SN: 0350 Location : AMERICA North (USA-Canada-Mexico)

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10″ COLLIMATED LENS FOR UP TO 6X6″ SQUARES OR 200mm WAFERS STEREO ZOOM OPTICS 350 WATT POWER SUPPLY, NEW LAMP Location : AMERICA North (USA-Canada-Mexico)

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8097 MASK ALIGNER 10″ DIAMETER LENS 350 WATT LAMP (CAN BE UPGRADED TO HIGHER POWER FOR ADDITIONAL COST) 4X4″ M Location : AMERICA North (USA-Canada-Mexico)

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with 10″ collimating lenses, for up to 8″ 200mm wafers. * Dual 1000 watt power supplies. * Dual 1000 watt lamp Location : AMERICA North (USA-Canada-Mexico)

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You can find used Wafer Equipment on Wotol

The main manufacturers of Wafer Equipment are KLA-Tencor, Karl Suss, Canon, Electroglas, Suss, Nikon, Semitool, TEL, Tokyo Semitsu Kogaku (TSK), Branson / IPC, MGI, Ultron, EVG, Allwin21, Abm, Accretech, ADE, AG Associates, AIO, Alessi, Applied Materials, ASM, ASML, Asyst Technologies, ATMI, Axcelis, Brooks Automation, Buehler, Cambridge, Cascade, Cascade Microtech, CDE (Creative Design Engineering), CEE, CHA, Control Micro Systems (CMS), Cymer, Dainippon Screen,Dektak, Denton, Disco, DNK, DNS, Dynapert, Dynatex, Electroglass, EV Group, Evergreen, Faith, Fluoroware, Fortrend Engineering, Gasonics, GCA, GSI Lumonics, Hitachi, HTG, IMT, InspecTech, Ionic Systems, Jeol, K & S, Kensington, KLA, Kokusai, LAM, Lam Research, Leica, Lintec, Loomis, Lumonics, Mactronix, Matsushita, Mech-El, Micro Automation, MRC, MTI, Nanometrics, Nitto, OAI, Olympus, Oriel, Oxford, Perkin Elmer, PRI, Prometrix, Recif SA, Rucker & Kolls, Suss MicroTec, SVG, Takatori, Tegal, Tencor, Tropel, Ultracision, Ultratech, Ulvac, Veeco, Verteq, Wentworth, Xynetics

The main model  MPASeries, CDS-650CT, PLA-501F, MA-4100, NSR-1505G4, 1000, Titan II, MA150,  6033, 2029,2020,2025, 6200Series, SM200E, Step 200,UM810, UH-130, UF3000 EX, SFX100, M777, FPA-5500iZa, SR8220-019, Desktop 1, 270 SRD, ST-260, 1600-55, 8100XP, 8100Series, 1H-DX, KP-4200, MA-4201Series, MA-1006, L200,UH130M,DFM-M150, CEE 100, SP323, MJB3Series, JWSSeries, MA6Series, SWC4000, EX-5700, 2001X, MDA-60FA, 680A, 8300, ARM200CF, S-5200, S-4700, AS5000, Axiotron II, INS330, Axiospect 301, SF 600, WaferMark II,3308, MASeries, 20T2/150VPO, 860, 1600-55A, UH 102, 4000, Eureka 450, ETI0392A-6-U, 425130, ETII-6910B-X-V, EET1-0395D-X-U, ETII-6910B-X-V, F-6225, 827, 907, 211,UVSeries, AIT8010, eCD2, 8100XPR, CD-SEMSeries, 8250, PC 4400, 300405, SFS 6420, 6D, MM-Cascade 6100, MJB-55, 179884/ P-2 OPEN FRAME, 8300X, 4500, ATRM-2100, SWC11, MAS-8000,ATM-1100E, 3A, 90, RTP-600xp, UKA-650, SPP8, MP 2300, BH-BHM, 2066,AL100-L8, IDLW8R, REL-4500, IDLW8R, MAS-8000, Fix Load25, UKA-825, SCW111, ATRM-2100D, 4055/2, Optistation 3, REL-4500, ResMap 178, 8097, 1600-55m, LSD 100, DSL 10, H100, RHM-06, 908, UH-130, 600W, 100FX, RS 35, P16+, 8620, MA8/BA8 Gen3, lle-855SS, 85DD, SFS7700, 2300 Versys, ZX-1000, Mark7, S-7800HSA, 5610,ES3, M-GAUGE 200, AITI,SFS7200, THERMA-WAVE OP 2600, MA150, 2115, 9400, NGP80, 620, XRF3640, CTR-200, TREX 610, F-4225, EET10395-4-U, SYO-200SS, MS100, RS-75, 7400/18, 2001X 6, PLA-501FA, PS300 Parametric Serie 12, DX-III, SHS 1000VAC, V300-Si, 12", WM650, AlphaStep 300, SURFSCAN 7700, 903eSeries, F6000QS, SP1 TB1, Nanolab 600, NWL860-TMB-SP, F5, DSS200, RS35C, MX-50, DD-823V-8BL, MicroSense 6300, 2400, 4400,E5200, 8108, 600FA, 40, MRC 603, 7700, VersaPort 2200, R-3, SSEC M10, ST-270 SRD, L3510, HTC 8020, Lumonics III, 1800-6AR, HTC 4000, SSW-60A-AR, 1034X, WST 306, ST-860, KIS 2000, L3510E, 9350, PSM 6, 80B, RS-35, DR-8500 II, 301, VLR RIE LM/TM, 20T2/150VPO, 1034 XA – 6, 4085XSeries, 682A, 500R 120-1007, E8025S, 100 RIE, M6000L, EV CS50, 150, RC8, ATM-105-1-S-CE-S293, MPC3000, DMI4000B, 5100, F5x, P-10, LP-200H, F200, CMS1030, CW1002-6200RW, 8860, APM90A, 3001X, APM5000, 880

HS Code 8486 10 10 for Apparatus for rapid heating of semiconductor wafers. 
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devicesde8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices

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