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Used Wafer Equipment

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1

Specifications: 2"-3" Chuck and holder for 4 in. square mask 78 mm diameter of wafer exposure Pow Location : AMERICA North (USA-Canada-Mexico)

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Specifications: Max wafer size: 5" diameter wafers Capable of Hard Contact, Soft Contact, and Proximi Location : AMERICA North (USA-Canada-Mexico)

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Features: Cassette to cassette operation SECS II/GEM Interface Fonts: SEMI OCR, BC412, and other d Location : AMERICA North (USA-Canada-Mexico)

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Specifications: Microscope: dual zoom, CCD TV camera Alignment accuracy: 0.5 um top side Lamp powe Location : AMERICA North (USA-Canada-Mexico)

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Features: Split field camera system Mask alignment is performed by adjusting the X-Y and theta microme Location : AMERICA North (USA-Canada-Mexico)

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Standard end effectors 2 cassette station swivel Cooling station Wafer aligner Robot with controller Temperatu Location : AMERICA North (USA-Canada-Mexico)

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Features: Autofeeder: single, cassette to cassette Backside wafer handling Specifications: Illumi Location : AMERICA North (USA-Canada-Mexico)

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Features: Three targets 5 in. x 15 in. Sputter etch capability Quartz substrate heaters, substrat Location : AMERICA North (USA-Canada-Mexico)

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Auto Feeder: Single, cassette to cassette, backside wafer handling Wafer size: Currently 5" (4" and 3" sizes a Location : AMERICA North (USA-Canada-Mexico)

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<b>1x, KLA-Tencor 7700 Wafer Surfscan Inspection System</b> A patterned and unpatterned wafer inspection and Location : AMERICA North (USA-Canada-Mexico)

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Model: VersaPort 2200 Used Details: The VersaPort 2200 is a 200mm class load port for presenting wafers on r Location : AMERICA North (USA-Canada-Mexico)

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Model: 1600 SRD Spin Rinse Dryer Used Details:A spin rinse dryer that accommodates wafers between 4" to 6". Location : AMERICA North (USA-Canada-Mexico)

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Model: YES R-3 Plasma Cleaning System Used Details:Capacitive downstream reactor Multi-program microprocessor Location : AMERICA North (USA-Canada-Mexico)

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Model: SSEC M10 Cleaner Used Details:Description: This single-sided cleaner is a fully automatic machine des Location : AMERICA North (USA-Canada-Mexico)

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Model: S-260 Single Stack SRD Used Details: A single stack spin rinse dryer (SRD). Features: Signal head Location : AMERICA North (USA-Canada-Mexico)

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Brand: Semitool Model: ST-270 SRD Used Details: Capability of 2" to 6" Wafers P328 controller Resisitivity m Location : AMERICA North (USA-Canada-Mexico)

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Model: L3510 Single Wafer Ashing System Used Details:The GaSonics L3510 is a versatile downstream photoresi Location : AMERICA North (USA-Canada-Mexico)

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Model: HTC 8020 Cassette Box Washer Used Details: Stainless Steel Dual Action Peripheral Cleaning System 2 Cl Location : AMERICA North (USA-Canada-Mexico)

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Model: 1800-6AR Mobile Single Stack SRD Used Details: Single stack unit 120V, 60Hz Resistivity monitoring Location : AMERICA North (USA-Canada-Mexico)

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Model: SSEC 50XP Cleaner Used Details: This single-sided cleaner is a fully automatic machine designed to scr Location : AMERICA North (USA-Canada-Mexico)

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Model: SSW-60A-AR Description: Scrubber. Single top side scrub - single backside with brush. Location : AMERICA North (USA-Canada-Mexico)

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Model: WST 306 Water Soluble Develop/Strip Tool Used Details:Non-phenolic biodegradable, low-toxicity chemica Location : AMERICA North (USA-Canada-Mexico)

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Model: ST-860 Double Stack SRD A double stack spin rinse dryer Used Details:Features: Dual stack SRD Capable Location : AMERICA North (USA-Canada-Mexico)

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Brand: Branson Model: IPC L3200 Dual quartz chambers for 100-150mm wafers cassette to cassette operation Aut Location : AMERICA North (USA-Canada-Mexico)

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Brand: GaSonics The 7100 Series is the most popular of the GaSonics International industrial batch treatment Location : AMERICA North (USA-Canada-Mexico)

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You can find used Wafer Equipment on Wotol

The main manufacturers of Wafer Equipment are KLA-Tencor, Karl Suss, Canon, Electroglas, Suss, Nikon, Semitool, TEL, Tokyo Semitsu Kogaku (TSK), Branson / IPC, MGI, Ultron, EVG, Allwin21, Abm, Accretech, ADE, AG Associates, AIO, Alessi, Applied Materials, ASM, ASML, Asyst Technologies, ATMI, Axcelis, Brooks Automation, Buehler, Cambridge, Cascade, Cascade Microtech, CDE (Creative Design Engineering), CEE, CHA, Control Micro Systems (CMS), Cymer, Dainippon Screen,Dektak, Denton, Disco, DNK, DNS, Dynapert, Dynatex, Electroglass, EV Group, Evergreen, Faith, Fluoroware, Fortrend Engineering, Gasonics, GCA, GSI Lumonics, Hitachi, HTG, IMT, InspecTech, Ionic Systems, Jeol, K & S, Kensington, KLA, Kokusai, LAM, Lam Research, Leica, Lintec, Loomis, Lumonics, Mactronix, Matsushita, Mech-El, Micro Automation, MRC, MTI, Nanometrics, Nitto, OAI, Olympus, Oriel, Oxford, Perkin Elmer, PRI, Prometrix, Recif SA, Rucker & Kolls, Suss MicroTec, SVG, Takatori, Tegal, Tencor, Tropel, Ultracision, Ultratech, Ulvac, Veeco, Verteq, Wentworth, Xynetics

The main model  MPASeries, CDS-650CT, PLA-501F, MA-4100, NSR-1505G4, 1000, Titan II, MA150,  6033, 2029,2020,2025, 6200Series, SM200E, Step 200,UM810, UH-130, UF3000 EX, SFX100, M777, FPA-5500iZa, SR8220-019, Desktop 1, 270 SRD, ST-260, 1600-55, 8100XP, 8100Series, 1H-DX, KP-4200, MA-4201Series, MA-1006, L200,UH130M,DFM-M150, CEE 100, SP323, MJB3Series, JWSSeries, MA6Series, SWC4000, EX-5700, 2001X, MDA-60FA, 680A, 8300, ARM200CF, S-5200, S-4700, AS5000, Axiotron II, INS330, Axiospect 301, SF 600, WaferMark II,3308, MASeries, 20T2/150VPO, 860, 1600-55A, UH 102, 4000, Eureka 450, ETI0392A-6-U, 425130, ETII-6910B-X-V, EET1-0395D-X-U, ETII-6910B-X-V, F-6225, 827, 907, 211,UVSeries, AIT8010, eCD2, 8100XPR, CD-SEMSeries, 8250, PC 4400, 300405, SFS 6420, 6D, MM-Cascade 6100, MJB-55, 179884/ P-2 OPEN FRAME, 8300X, 4500, ATRM-2100, SWC11, MAS-8000,ATM-1100E, 3A, 90, RTP-600xp, UKA-650, SPP8, MP 2300, BH-BHM, 2066,AL100-L8, IDLW8R, REL-4500, IDLW8R, MAS-8000, Fix Load25, UKA-825, SCW111, ATRM-2100D, 4055/2, Optistation 3, REL-4500, ResMap 178, 8097, 1600-55m, LSD 100, DSL 10, H100, RHM-06, 908, UH-130, 600W, 100FX, RS 35, P16+, 8620, MA8/BA8 Gen3, lle-855SS, 85DD, SFS7700, 2300 Versys, ZX-1000, Mark7, S-7800HSA, 5610,ES3, M-GAUGE 200, AITI,SFS7200, THERMA-WAVE OP 2600, MA150, 2115, 9400, NGP80, 620, XRF3640, CTR-200, TREX 610, F-4225, EET10395-4-U, SYO-200SS, MS100, RS-75, 7400/18, 2001X 6, PLA-501FA, PS300 Parametric Serie 12, DX-III, SHS 1000VAC, V300-Si, 12", WM650, AlphaStep 300, SURFSCAN 7700, 903eSeries, F6000QS, SP1 TB1, Nanolab 600, NWL860-TMB-SP, F5, DSS200, RS35C, MX-50, DD-823V-8BL, MicroSense 6300, 2400, 4400,E5200, 8108, 600FA, 40, MRC 603, 7700, VersaPort 2200, R-3, SSEC M10, ST-270 SRD, L3510, HTC 8020, Lumonics III, 1800-6AR, HTC 4000, SSW-60A-AR, 1034X, WST 306, ST-860, KIS 2000, L3510E, 9350, PSM 6, 80B, RS-35, DR-8500 II, 301, VLR RIE LM/TM, 20T2/150VPO, 1034 XA – 6, 4085XSeries, 682A, 500R 120-1007, E8025S, 100 RIE, M6000L, EV CS50, 150, RC8, ATM-105-1-S-CE-S293, MPC3000, DMI4000B, 5100, F5x, P-10, LP-200H, F200, CMS1030, CW1002-6200RW, 8860, APM90A, 3001X, APM5000, 880

HS Code 8486 10 10 for Apparatus for rapid heating of semiconductor wafers. 
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devicesde8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices

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