Used Semiconductor Equipment

Rated Power Output 1000 Watts Chamber Construction Aluminum/box Chamber Size Width 13.00 in (33.02 cm Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Microscope Type Compound Multiple Objectives Models American Optical Microscope Objectives: 4/.12 Plan ach Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Wafer Size Range Maximum 150 mm Microscope Type Microzoom X-Y Optics Motion YES Vacuum Chuck Diamet Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Specification: Exposition mode: Manual, semi-automatic of fully automatic Dimensions of the table: 100 mm x 1 Location : EUROPE (Central and Eastern)

Price : On request

Specification: Dimensions of the table: 100 mm x 100 mm Height adjustability: 50 mm (max) Range of contact an Location : EUROPE (Central and Eastern)

Price : On request

Specification: Au wire diameter: 12,7µm (min) - 76µm (max) Al wire diameter: 20µm (min) - 76µm (max) Bonding f Location : EUROPE (Central and Eastern)

Price : On request

EC101 PHOTORESIST COATER (CB-15) WITH 15″ DIAMETER BOWL AND TABLE TOP STAND Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Deep Access 90° Feed Wedge Wire Bonder Location : EUROPE (Western and Northern)

Price : On request

Large substrate coater (typicially for photoresist) includes safety enclosure 6 six speeds 14 timers Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Bonder (s/n 12723), which is currently set up with the Wedge Bond Head with 90° Feed Deep Access Clamps, makin Location : EUROPE (Western and Northern)

Price : On request

Mask Aligner is 7″ in diameter lens includes microscope (not shown) and 350 watt lamp. Location : AMERICA North (USA-Canada-Mexico)

Price : On request

HAS COAT BAKE AND DEVELOP STATIONS Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Process: Thin Film Stress Measurement System Year(s) : 2004 Location : EUROPE (Western and Northern)

Price : On request

4 HEAD PHOTORESIST COATER Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Innolas Wafermarker Wafermarker C3000DPS Marking for 300mm Wafers Wafer Size Range Minimum 200 mm Maximum 3 Year(s) : 2002 Location : EUROPE (Western and Northern)

Price : On request

HF-8 Plasma System LCD Display Dual Mass Flow Controllers Parallel Plate Shelf Optional Rebuilt Dual Stage Vac Location : AMERICA North (USA-Canada-Mexico)

Price : On request

SEM Location : ASIA (North East)

Price : On request

Photolithography Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Inspection/Defect Location : ASIA (North East)

Price : On request

Features: Flexible range. Capable of 1 to 100W operation Greater stability Reproducible conditions Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Surface roughness measuring machine Year: Model: 2011 Measurement range/resolution: Z axis 800μm/0.01μm, 80 Year(s) : 2011 Location : ASIA (North East)

Price : On request

○Main specifications ・Product configuration: Atmospheric pressure plasma unit (Type FPE), plasma irradiation r Year(s) : 2015 Location : ASIA (North East)

Price : On request

Vintage: 12/2018 Benchtop 3D Automated Optical Inspection System Direct Loading Max PCB Size: 520mm Orca Chas Year(s) : 2018 Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Cylinder cabinet (NH3,NH3) Year(s) : 1993 Location : ASIA (North East)

Price : On request

Taping machine Year(s) : 1994 Location : ASIA (North East)

Price : On request