Used Semiconductor Equipment

Dry Pump Model A30W Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Film Thickness Measurement System Configuration 200 MM Wafer Configuration Year(s) : 1998 Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Canon FPA- 5500iZ+ Wafer Size Range Minimum 300 mm Maximum 300 mm Set Size 300 mm Other Information Year(s) : 2004 Location : EUROPE (Western and Northern)

Price : On request

General Configuration: FPA 3000 - i5(+) Manufactured in June / 1997 8“ Wafer Chuck, Notch PA unit 6“ Nikon-ty Year(s) : 1997 Location : EUROPE (Western and Northern)

Price : On request

- X and Y axis micrometers on stage - 12" diameter screen - 20X objective lenses - 115V - 50/60Hz - 2A Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Precision Ion Polishing System Designed to produce high quality TEM specimens Full manual control Reliable ope Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Automated Optical Inspection System 3D Inspection DOM: 03/2018 Multi-function system with top-down viewing, C Year(s) : 2018 Location : AMERICA North (USA-Canada-Mexico)

Price : On request

X-ray Inspection System Standalone Closed Tube 160kV 70 degree Oblique view 1,500 X Geometric Magnification (7 Year(s) : 2010 Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Plasma Etch System: It uses a plasma-based process to selectively remove materials from the wafer surface, suc Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Auto Etch 490 Location : AMERICA North (USA-Canada-Mexico)

Price : On request

a. VCE Bellows b. MAG 7 Robot c. 2 – Chamber 4520 XLE d. Enhanced 12 gas Gas Box Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Mounting Bulkhead Wafer Size 200 MM Software Envision 1.52 Indexers HINE AC Box -001 Gas Box Orbital Welded Cl Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Mounting Bulkhead Wafer Size 200 MM Software Envision 1.52 Indexers HINE AC Box -002 Gas Box Orbital Welded Cl Location : AMERICA North (USA-Canada-Mexico)

Price : On request

4420 Oxide Etch System Location : AMERICA North (USA-Canada-Mexico)

Price : On request

Features: - thin film deposition - encapsulation - coating - eg SiO 2 , SiN x , SiON x , a Si - up to 200 mm w Year(s) : 2015 Location : EUROPE (Western and Northern)

Price : On request

- Alignment System MA150e TSA - PC -Aut. Adjustment ( Autoalignment System) Cognex 8100 ( Patmex ) TSA - Lamph Location : EUROPE (Western and Northern)

Price : On request

Longdescription: with 6" vacuum Chuck Microscope Ocular: Bausch & Lomb 10 x W.F. Objective: 2,25 x 0,04,8 x 0 Location : EUROPE (Western and Northern)

Price : On request

- Light-tight enclosure designed for wafer probers - Cable ports on both sides of the box - Easy-lift Location : AMERICA North (USA-Canada-Mexico)

Price : On request

- Measurement Angles: 20°, 60°, and 85° (from high to low gloss) - Reflection Haze: Yes, for high gloss finish Location : AMERICA North (USA-Canada-Mexico)

Price : On request

- Control: Electronic controls with touch screen display - Sample Holder: 6-position with precise down press Location : AMERICA North (USA-Canada-Mexico)

Price : On request

- Blade Speed: 200 to 5000 rpm - Blade Diameter Capability: 3" to 8" wafer blades - Feed Mechanism: Linear Location : AMERICA North (USA-Canada-Mexico)

Price : On request