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Nanometrics

Ref : 1885550-9
Condition : Used
Manufacturer : Nanometrics
Model : -
Year(s) : -
Quantity : 0
Location : Seller or machines location:
AMERICA North (USA-Canada-Mexico)
Last check : 28 Sep. 2018

Nanometrics 4150 Metrology

Description:
Film Thickness, reflectivity & mapping system,Standard wafer sizes of 6 & 8 inch stages, Single and multiple layer measurement programs,Ability to select film constants,Scan ranges and substrate types,High Speed auto-focus Torret style objectives head,MSPlan 5, MSPlan 10, MSPlan 50,Reflecting objective x15, Programmable mapping stage: Accuracy +/- 2 mm Data Analysis, motorized stage,Stage accuracy: 2mm High resolution contour and 3D mapping,Pulnix TMC-7 camera Rapid Measurement Program development Extensive Data management and SPC capabilities,,Mapping: contour,2D & 3D 115VAC, 5A,50/60Hz