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Used Metrology and inspection equipment

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1

Hg CV plotter Location : AMERICA North (USA-Canada-Mexico)

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Cascade Summit 12K Semi-automatic wafer prober,Microchamber,8-inch thermal chuck,AttoGuard Shielding, Temptron... Location : AMERICA North (USA-Canada-Mexico)

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<b>1x Cascade, S300, Probers, 2004 Description</b> Configuration: up to 300mm Cascade S300 Semi-Automat... Year(s) : 2004 Location : AMERICA North (USA-Canada-Mexico)

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Sloan Dektak 3030 Metrology Description Auto II Measuring Range: 100 A to 1310KA Vertical Resolution: 1A... Location : AMERICA North (USA-Canada-Mexico)

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KLA-Tencor Alpha Step 200 Metrology Description Profilometer Vertical Measurement Ranges: Auto ranging up... Location : AMERICA North (USA-Canada-Mexico)

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KLA-Tencor Quantox Surface Contamination Description: KLA-Tencor Quantox 64100 Wafer capability of 4 - 12"... Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)

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Veeco Dektak V200 Si Metrology Description: Stylus profiler for up to 200mm substrates. Range 0.3-30mg sty... Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)

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Nanometrics 8000 XSE Metrology Description: Cassette to Cassette Thin Film measurement system w/Ellipsomet... Year(s) : 1998 Location : AMERICA North (USA-Canada-Mexico)

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Nanometrics 8000x Metrology Description: Cassette to Cassette Thin Film measurement system 8" wafer stage,... Year(s) : 1997 Location : AMERICA North (USA-Canada-Mexico)

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Hitachi S-8820 Metrology Description: Hitachi S8820 CD-SEM,SEM Magnification 1,000x to 150,000x,Wafer imag... Year(s) : 1997 Location : AMERICA North (USA-Canada-Mexico)

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KLA-Tencor UV1250SE Metrology Description: KLA UV1250SE thin film measurement and UV Spectrospoic Ellipsom... Location : AMERICA North (USA-Canada-Mexico)

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Rudolph Auto EL III-2 Metrology Description: Ellipsometer 633 HeNe laser source 4A option, – X/Y stage wit... Location : AMERICA North (USA-Canada-Mexico)

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KLA-Tencor Flexus 2320 Metrology Year(s) : 1994 Location : AMERICA North (USA-Canada-Mexico)

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Prometrix FT 750 Metrology Description: Model FT 750 patterned mapping system, single & double layer films... Location : AMERICA North (USA-Canada-Mexico)

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Rudolph MetaPulse 300 Cu Thin Film Metrology Description: Rudolph MetaPulse 300 Cu Thin-Film measurement t... Year(s) : 2002 Location : AMERICA North (USA-Canada-Mexico)

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Nanometrics 4150 Metrology Description: Film Thickness, reflectivity & mapping system,Standard wafer sizes... Year(s) : 1994 Location : AMERICA North (USA-Canada-Mexico)

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Nanometrics 210 Metrology Description: Thin film thickness measurement system for transparent films on 75... Location : AMERICA North (USA-Canada-Mexico)

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Nanometrics 210 Metrology Description: Thin film thickness measurement system for transparent films on 75m... Location : AMERICA North (USA-Canada-Mexico)

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Veeco Dektak IIA Thin Film Metrology Description: Programmable Linear scanning system used for accurate me... Year(s) : 1983 Location : AMERICA North (USA-Canada-Mexico)

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Prometrix FT 500 Metrology Description: Thin Film Location : AMERICA North (USA-Canada-Mexico)

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Prometrix SM200 Metrology Description: Film Thickness Mapping System for un-patterned wafers C2C Handler 2... Location : AMERICA North (USA-Canada-Mexico)

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KLA-Tencor 4000 Description: Model 4000 Surfscan Location : AMERICA North (USA-Canada-Mexico)

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KLA-Tencor Swift Station Description: Computer for 7700's Location : AMERICA North (USA-Canada-Mexico)

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Surface Contamination Analyser Model # 4500 Non-patterned wafer inspection capable of up to 6” wafers (150mm)... Location : AMERICA North (USA-Canada-Mexico)

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Nanometrics CD-50-2 Metrology Description: Critical Dimension Measurement MEASUREMENT SYSTEM TO INCLUDE: 1... Location : AMERICA North (USA-Canada-Mexico)

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