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Used Metrology and inspection equipment

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1

Therma-Wave Opti-Probe 3290 DUV Thin film measurement. Configured for 4 to 8 inch wafers Serial number 3111 So... Location : AMERICA North (USA-Canada-Mexico)

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System supports Beam Profile Reflectrometry (BPR) and Beam Profile Ellipsometry (BPE) modes BPR (Beam Profile... Location : AMERICA North (USA-Canada-Mexico)

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BioRad Microscope with (4) objectives MPlan (5,10,20,50),Hitachi KP-140 camera,top and lower light source. Location : AMERICA North (USA-Canada-Mexico)

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Therma-Wave Opti-Probe 3290 DUV Thin film measurement. Configured for 4 to 8 inch wafers Serial number 6990 So... Location : AMERICA North (USA-Canada-Mexico)

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1

Soluris IVS 155 Critical Dimension and optical Overlay system, Cassette to Cassette, Dual end effector, (3)... Year(s) : 2005 Location : AMERICA North (USA-Canada-Mexico)

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KLA-Tencor 7600 Particle Inspection Station, Capable of up to 200mm wafers, for Patterned Surface Inspection S... Year(s) : 1993 Location : AMERICA North (USA-Canada-Mexico)

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Desktop Mercury Probe CV Mapper CV92A Embedded computer and a PC Up to 200 mm - 8 inch capability Drawer for r... Location : AMERICA North (USA-Canada-Mexico)

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Hitachi S8820 CD-SEM,SEM Magnification 1,000x to 150,000x,Wafer imaging ability: Entire surface of 8” wafer, D... Location : AMERICA North (USA-Canada-Mexico)

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KLA Tencor AIT UV Automated Darkfield Defect Inspection station for Pattern Wafers,More powerfull and greater... Location : AMERICA North (USA-Canada-Mexico)

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Computer for 7700's Location : AMERICA North (USA-Canada-Mexico)

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Film Thickness Mapping System for un-patterned wafers C2C Handler 2mm size spot for up to 625 locations per wa... Location : AMERICA North (USA-Canada-Mexico)

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Prometrix Model: FT 500 Thin Film Location : AMERICA North (USA-Canada-Mexico)

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KLA-Tencor Quantox 64100 Wafer capability of 4 - 12" (300mm), Options include: Quick Map, Lifetime, Bulk Recom... Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)

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Thin Film Metrology Manufacturer: Prometrix Model: FT 650 Equipment Name: Configuration: Serial number 9101... Location : AMERICA North (USA-Canada-Mexico)

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Programmable Linear scanning system used for accurate measurements on vertical features ranging in height from... Year(s) : 1983 Location : AMERICA North (USA-Canada-Mexico)

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tylus profiler for up to 200mm substrates. Range 0.3-30mg stylus force. Programmable 200mm stage with 8"x8" XY... Year(s) : 2001 Location : AMERICA North (USA-Canada-Mexico)

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Model: Flexus 2320 Equipment Name: 4334 Configuration: 2-8" wafersThin Film Stress measurement system. Window... Year(s) : 1994 Location : AMERICA North (USA-Canada-Mexico)

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Model FT 750 patterned mapping system, single & double layer films, 100-200mm wafers, 410nm-800nmreflectivity... Location : AMERICA North (USA-Canada-Mexico)

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Model: 8000 XSE. Cassette to Cassette Thin Film measurement system w/Ellipsometer 8" wafer stage, Operating s... Year(s) : 1998 Location : AMERICA North (USA-Canada-Mexico)

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Thin film thickness measurement system for transparent films on 75mm to 150mm wafers, measures 14 standard fil... Location : AMERICA North (USA-Canada-Mexico)

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Hitachi S8820 CD-SEM,SEM Magnification 1,000x to 150,000x,Wafer imaging ability: Entire surface of 8” wafer, D... Year(s) : 1997 Location : AMERICA North (USA-Canada-Mexico)

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Model: 8000x Cassette to Cassette Thin Film measurement system 8" wafer stage, Operating system - IBM OS 75W l... Year(s) : 1997 Location : AMERICA North (USA-Canada-Mexico)

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Surface Contamination Analyser Model # 4500 Non-patterned wafer inspection capable of up to 6” wafers (150mm)... Location : AMERICA North (USA-Canada-Mexico)

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Model: Auto EL III-2 Ellipsometer 633 HeNe laser source 4A option, – X/Y stage with Slide tray Wavelengths of... Location : AMERICA North (USA-Canada-Mexico)

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Thin film thickness measurement system for transparent films on 75mm to 150mm wafers, measures 14 standard fil... Location : AMERICA North (USA-Canada-Mexico)

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