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Oxford 100 ICP

Ref : 2118845-9-W
Condition : Used
Manufacturer : Oxford
Model : 100 ICP
Year(s) : -
Quantity : 1
Location : Seller or machines location:
AMERICA North (USA-Canada-Mexico)
Last check : 07 Feb. 2022

Max Wafer: 200mm
System Dimensions: 74x34x71
Configuration:
200mm platen, Load-locked single chamber, Chlorine chemistry for metal etch process
- Inductive Coupled Plasma Source (ICP380)
- Chuck size: 8"/200m diameter (8" platen)
- Chuck type: Mechanical Wafer Clamping
- Load-locked single chamber (ICP)
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- 2 Tempatron TC4800 Temperature Controllers
- EMO Button
- Operations Manual and Documentation
- Offered as Fully Refurbished and Meeting Original Specifications.

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