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Tepla 300E

Ref : 1956316-9
Condition : Used
Manufacturer : Tepla
Model : 300E
Year(s) : -
Quantity : 1
Location : Seller or machines location:
AMERICA North (USA-Canada-Mexico)
Last check : 05 Aug. 2020

Tepla 300E

Description:
Microwave Plasma Etcher Applications · Photoresist stripping · Mask Etching · Surface Cleaning · Etching of Glass and ceramics · Etching of SiO2, Si3N4, Si · Removal of Polyimid and passivation layer Process chamber – quartz w/ KAPTON cover Dimensions · 9.5 inches inner diameter · 380 mm depth (3) separate gas channels controlled by MFC’s (O2, N2, Phoshorous) Maximum flow rate per channel 500 sccm Working pressure 0.5 – 1.5 mbar 250V, 15A

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