Used Plasma Etcher / Asher
433 results8300 Weight 36 lb (16 kg) Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsEtcher Type Planar - Magnetron Rated Power Output 4000 Watts Reactor Center Rectangular Reactor Center Size Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size Range Minimum 50 mm Maximum 200 mm Set Size 150 mm Process Chlorine Etch Loadlock Loadloc Year(s) : 2003 Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size Range Minimum 50 mm Maximum 200 mm Set Size 150 mm Process Silicon Etch Bosch Process Loadlo Location : AMERICA North (USA-Canada-Mexico)
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More detailsMaximum 100 mm Process Plasma etch Controller Type Microprocessor Controller Type End Point Detection Yes Location : AMERICA North (USA-Canada-Mexico)
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More detailsRated Power Output 300 Watts Reactor Center Cylindrical Reactor Center Size Depth 12.00 in (30.48 cm) Location : AMERICA North (USA-Canada-Mexico)
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More detailsEtcher Type Box Rated Power Output 600 Watts Reactor Center Rectangular Reactor Center Size Width 12.0 Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size Range Minimum 75 mm Maximum 200 mm Set Size 150 mm Process Nitride Etch Controller Type Location : AMERICA North (USA-Canada-Mexico)
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More detailsProcess Reactive Ion Etch System Controller Type PC Controller Type High Vacuum Pump Leybold 361C Roughing Year(s) : 1998 Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size Range Minimum 50 mm Maximum 200 mm Process RIE/Plasma Deposition Controller Type Micropro Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size Range Minimum 50 mm Maximum 200 mm Controller Type PC Controller Type High Vacuum Pump Le Location : AMERICA North (USA-Canada-Mexico)
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More detailsResistive heated lower electrode up to 350 C, watlow temperature controller Cooling/heating circuit in chamber Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size Range Minimum 50 mm Maximum 200 mm Process Reactive Ion Etch System Controller Type PC Co Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size Range Maximum 150 mm Process Reactive Ion Etch System Controller Type PC Controller Type Hig Location : AMERICA North (USA-Canada-Mexico)
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More detailsPanel Meters Digital External Cooling Water Cooled Accessories MKS pressure transducer--Type 122A Seven s Location : AMERICA North (USA-Canada-Mexico)
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More detailsAsher Type Barrel Rated Power Output 1000 Watts Chamber Construction Quartz Chamber Size - Cylindrical Location : AMERICA North (USA-Canada-Mexico)
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More details200mm Tool ID: PNIT-02 Year(s) : 1994 Location : AMERICA North (USA-Canada-Mexico)
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More details200mm Year(s) : 1996 Location : AMERICA North (USA-Canada-Mexico)
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More detailsWafer Size Range Minimum 100 mm Maximum 150 mm Condition Good Serial Number(s) Inline-Sprühätzanlage Year(s) : 2009 Location : EUROPE (Western and Northern)
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More detailsDry: Etching system/12in Year(s) : 2002 Location : ASIA (North East)
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More detailsOxide_Etch Location : ASIA (North East)
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More detailsDip-etch wet bench Year(s) : 1998 Location : EUROPE (Western and Northern)
Price : On request
More detailsEtching Hood Location : ASIA (North East)
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More detailsparticle count Wafer Size 8" Location : ASIA (North East)
Price : On request
More detailsHF vapor etch Wafer Size 8" Location : ASIA (North East)
Price : On request
More detailsYou can find used Plasma Etcher / Asher on Wotol
The main manufacturers of Plasma Etcher / Asher are Plasmatherm, Tegal, AMAT, LAM, Branson / IPC, Gasonics, Technics, Oxford, Matrix, Tepla, Branson, Axic, Applied Materials, March Instruments,Advanced , Akrion , Alcan Tech , Anatech , Anelva , APS , Aviza , Barrel , Canon , Chemcut , Depeltronic , DNS , Drytek , DSS , Ebara, Erretre , Fisons , Fusion , Gatan, Glen, GPTC, Hitachi, Hoellmueller, Innovative, Ion , Lam Rainbow, Lam Research, LFE , March , Matheson, Mattson, Metroline / IPC, Mitsui Shibaura, MKS, MRL Industries, Multi, Multiline, Nordson, Norfield, Novellus, Occleppo, Oxford Instruments, Perkin Elmer, PILL, Plasma, Plasma Technology, PSC, PSK, PVA, Research, Samco, Santa Clara, Schmid, Semi Group, Semitool, SEZ, Shibaura, Solaris, Spec, SPTS, Ssec, Steag, STS , Suss MicroTec , TEL , Toho , TOK , Tokyo Electron, Trebor, Ultratech, Ulvac, Unaxis Varian, Veeco, Verteq, Wise, Xinix , Yield Engineering Systems (YES), Yokogawa.
The main model PMC-PEM, 650/04/P-50Wise Alk, DV38, Telius 305 SCCM, AX7670-81 REV: A, RFX600A,GIGA 690, TORUS300K, V55-G, BOFA AD-350, PC-1100, P-5020E P-5030, PE-8330A, ILD-4033, Gamma 2100, 4520, 4420, ACP DPN HD, Tetra 150, 8300, 9104, DPS ll MESA T2, DPSSeries, FLEX FX, TERA21, Rainbow-4420, OAPM-306B, Y Rainbow-4500, DES-112, Envision HDI DMS-E, PCB 1600, XＳ5-, NE-950EX V, co. Ltd. Typ TY-STP-S1, 650/06/P-50, Steag 300mm, RST101, 8330, M308, APIOS ISM CE-300I, SLR-720, R3A 500W, 9204, PX500, 300L ICP, TE3100 ICP, 830, 133 ICP - 380 Source, 1600-55A, 820 RIE, 90 Plus RIE, 790 RIE, PP-1000, VLN - Versaline , PX250, PM-600, PVLR ICP , 790Series VLR ICP MRL Industries Cyclon, SLR 720 RIE, 200E, RF350 C2 IBE, L3100/3, SLR 720,770 ICP, RF350 C2 IBD, RIE 800 – PC, Technics 220-II, SLR 730, 7200 RIE, SLR 720 RIE, 770 ICP, R1, 2000, 830, Oxford 90 Plus RIE R3A, RIE 800, 133 ICP - 380 Source, R3, l7300, PEII A, 600Series, Batchtop VII, PT530, 105Series, 700 VLRSeries, SLR 720, 770 ICP, SLR 720 RIE, HF-8, 730/720 RIE, 8800, NH3 & N2, P7200 RIE, PEII A, 300E, 600 Series, 303, 730/720 RIE, SLRSeries 8800, MK III , L3200, ATE-3000.
HS Code 8543 70 08 For Plasma cleaner machines that remove organic contaminants from electron microscopy specimens and specimen holders.
HS Code 8543 Electrical machines and apparatus, having individual functions, not specified or included elsewhere in this Chapter.