Used Wafer Equipment
452 results• Type: Spin Rinser Dryer • Application: Cleaning, rinsing, and drying for wafer cassettes • Wafer Batch: 25 w Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details• Type: Rapid Thermal Processing System • Wafer Sizes: Small pieces, 2", 3", 4", 5", 6", 8" (currently configu Year(s) : 2021 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details• Type: Manual probe station • Optics: B&L stereo zoom 4 • Optional upgrade: Zoom 5 (+$100), Zoom 7 (+$400) • Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details• Wafer size: 4″ • Optics: Mitutoyo high-power microscope with Microzoom optics • Objectives: 2 included • Chu Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsCanon FPA- 5500iZ+ Wafer Size Range Minimum 300 mm Maximum 300 mm Set Size 300 mm Other Information Year(s) : 2004 Location : EUROPE (Western and Northern)
Price : On request
More detailsGeneral Configuration: FPA 3000 - i5(+) Manufactured in June / 1997 8“ Wafer Chuck, Notch PA unit 6“ Nikon-ty Year(s) : 1997 Location : EUROPE (Western and Northern)
Price : On request
More detailsAntistatic device for ultrapure water Location : ASIA (North East)
Price : On request
More detailsAS-IS Refurbish Wafer Size: 200mm PROCESS: PHOTO WAFER FLOW DIRECTION RIGHT TO LEFT LOADING CONFIG 4 CASSETTE Year(s) : 1995 Location : EUROPE (Western and Northern)
Price : On request
More details- Wafer Size: 300 mm - Chuck Type: Femtoguard temperature chuck - Temperature Range: -60°C to +300°C - S Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsRAD-3510F/12, 300mm, s/n: D13S000081 Year(s) : 2012 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsASPEN 2, 200mm Year(s) : 1999 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More details8100, 200mm, s/n: Cont 1 1188 HP & Sulfuric Ozone Tool ID: 67R Year(s) : 1999 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsMax Wafer: 200mm System Dimensions: 30x40x66 Weight: 695 lbs - Automatic Surface Inspection System - Bare W Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsKLA SURFSCAN 6220 - Defect inspection system Vintage: 1992+/-5j Wafersize: 200mm Dimensions & weight estimate Year(s) : 1992 Location : EUROPE (Western and Northern)
Price : On request
More detailsFilm/Wafer Mounters Accessories Monitor Condition Good Year(s) : 2007 Location : EUROPE (Western and Northern)
Price : On request
More detailsInker Machine (8 inch wafer) Wafer Size Range Set Size 200 mm Condition Good Power Requirements 115 V Year(s) : 2001 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer Production Equipment, 200mm, s/n: PTG00690EX Year(s) : 2000 Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsInker Machine (8 inch wafer) Wafer Size Range Set Size 200 mm Condition Good Power Requirements 115 V Year(s) : 2001 Location : EUROPE (Western and Northern)
Price : On request
More detailsKLA-TENCOR UV-1280SE THIN FILM MEASUREMENT SYSTEM consisting of: - Model: Prometrix UV-1280SE - Configured fo Location : AMERICA North (USA-Canada-Mexico)
Price : On request
More detailsWafer size: 300mm Asset HDD not included Tool config is based on original PO, please verify tool details at to Year(s) : 2014 Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer size: 200mm Date of Last PM : 17th Dec 2015 System is not On-Line Off-Line Date (if applicable) is June Location : EUROPE (Western and Northern)
Price : On request
More detailsWafer size: 300mm Install Type: Stand-Alone Can Produce Wafers As-Is: Yes CE Mark Certified: Yes Are any Manua Year(s) : 2007 Location : EUROPE (Western and Northern)
Price : On request
More detailsCleanroom with Power Off after refurbishing. Wafer : 8 Inches. Basic Standard Configuration. Need to install R Year(s) : 2004 Location : EUROPE (Western and Northern)
Price : On request
More detailsAccessories Monitors Year of Manufacture 2017 Condition Good Year(s) : 2017 Location : EUROPE (Western and Northern)
Price : On request
More detailsThe Spin Rinse Dryer is used for rinsing and drying substrates. Max. size: 8" low profile, NOT Aus on the fro Year(s) : 2017 Location : EUROPE (Western and Northern)
Price : On request
More detailsYou can find used Wafer Equipment on Wotol
The main manufacturers of Wafer Equipment are KLA-Tencor, Karl Suss, Canon, Electroglas, Suss, Nikon, Semitool, TEL, Tokyo Semitsu Kogaku (TSK), Branson / IPC, MGI, Ultron, EVG, Allwin21, Abm, Accretech, ADE, AG Associates, AIO, Alessi, Applied Materials, ASM, ASML, Asyst Technologies, ATMI, Axcelis, Brooks Automation, Buehler, Cambridge, Cascade, Cascade Microtech, CDE (Creative Design Engineering), CEE, CHA, Control Micro Systems (CMS), Cymer, Dainippon Screen,Dektak, Denton, Disco, DNK, DNS, Dynapert, Dynatex, Electroglass, EV Group, Evergreen, Faith, Fluoroware, Fortrend Engineering, Gasonics, GCA, GSI Lumonics, Hitachi, HTG, IMT, InspecTech, Ionic Systems, Jeol, K & S, Kensington, KLA, Kokusai, LAM, Lam Research, Leica, Lintec, Loomis, Lumonics, Mactronix, Matsushita, Mech-El, Micro Automation, MRC, MTI, Nanometrics, Nitto, OAI, Olympus, Oriel, Oxford, Perkin Elmer, PRI, Prometrix, Recif SA, Rucker & Kolls, Suss MicroTec, SVG, Takatori, Tegal, Tencor, Tropel, Ultracision, Ultratech, Ulvac, Veeco, Verteq, Wentworth, Xynetics
The main model MPASeries, CDS-650CT, PLA-501F, MA-4100, NSR-1505G4, 1000, Titan II, MA150, 6033, 2029,2020,2025, 6200Series, SM200E, Step 200,UM810, UH-130, UF3000 EX, SFX100, M777, FPA-5500iZa, SR8220-019, Desktop 1, 270 SRD, ST-260, 1600-55, 8100XP, 8100Series, 1H-DX, KP-4200, MA-4201Series, MA-1006, L200,UH130M,DFM-M150, CEE 100, SP323, MJB3Series, JWSSeries, MA6Series, SWC4000, EX-5700, 2001X, MDA-60FA, 680A, 8300, ARM200CF, S-5200, S-4700, AS5000, Axiotron II, INS330, Axiospect 301, SF 600, WaferMark II,3308, MASeries, 20T2/150VPO, 860, 1600-55A, UH 102, 4000, Eureka 450, ETI0392A-6-U, 425130, ETII-6910B-X-V, EET1-0395D-X-U, ETII-6910B-X-V, F-6225, 827, 907, 211,UVSeries, AIT8010, eCD2, 8100XPR, CD-SEMSeries, 8250, PC 4400, 300405, SFS 6420, 6D, MM-Cascade 6100, MJB-55, 179884/ P-2 OPEN FRAME, 8300X, 4500, ATRM-2100, SWC11, MAS-8000,ATM-1100E, 3A, 90, RTP-600xp, UKA-650, SPP8, MP 2300, BH-BHM, 2066,AL100-L8, IDLW8R, REL-4500, IDLW8R, MAS-8000, Fix Load25, UKA-825, SCW111, ATRM-2100D, 4055/2, Optistation 3, REL-4500, ResMap 178, 8097, 1600-55m, LSD 100, DSL 10, H100, RHM-06, 908, UH-130, 600W, 100FX, RS 35, P16+, 8620, MA8/BA8 Gen3, lle-855SS, 85DD, SFS7700, 2300 Versys, ZX-1000, Mark7, S-7800HSA, 5610,ES3, M-GAUGE 200, AITI,SFS7200, THERMA-WAVE OP 2600, MA150, 2115, 9400, NGP80, 620, XRF3640, CTR-200, TREX 610, F-4225, EET10395-4-U, SYO-200SS, MS100, RS-75, 7400/18, 2001X 6, PLA-501FA, PS300 Parametric Serie 12, DX-III, SHS 1000VAC, V300-Si, 12", WM650, AlphaStep 300, SURFSCAN 7700, 903eSeries, F6000QS, SP1 TB1, Nanolab 600, NWL860-TMB-SP, F5, DSS200, RS35C, MX-50, DD-823V-8BL, MicroSense 6300, 2400, 4400,E5200, 8108, 600FA, 40, MRC 603, 7700, VersaPort 2200, R-3, SSEC M10, ST-270 SRD, L3510, HTC 8020, Lumonics III, 1800-6AR, HTC 4000, SSW-60A-AR, 1034X, WST 306, ST-860, KIS 2000, L3510E, 9350, PSM 6, 80B, RS-35, DR-8500 II, 301, VLR RIE LM/TM, 20T2/150VPO, 1034 XA – 6, 4085XSeries, 682A, 500R 120-1007, E8025S, 100 RIE, M6000L, EV CS50, 150, RC8, ATM-105-1-S-CE-S293, MPC3000, DMI4000B, 5100, F5x, P-10, LP-200H, F200, CMS1030, CW1002-6200RW, 8860, APM90A, 3001X, APM5000, 880
HS Code 8486 10 10 for Apparatus for rapid heating of semiconductor wafers.
HS Code 8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devicesde8486 Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices