ASIA (North East)
Wafer Size 8"
The Therma-Wave Opti-Probe 2600 and 2690 are used for measurement of a wide range of optical parameters such as film thickness of multiple layers and index of refraction. Compatible with wafers ranging from 4- to 8-inches, the system has two cassette loader stations. The Opti-Probe supports Beam Profile Reflectrometry (BPR) and Beam Profile Ellipsometry (BPE) modes. A 675 nm thermoelectrically cooled diode laser is used to establish the optical parameter and in spectrometry mode a visible 450 to 840 nm tungsten halogen lamp it used.
Supports the full range of thick and thin film, refractive indexes, extinction coefficient and reflectivity measurements
Multi-layer and multi-parameter measurements on thin ONO and OPO film stacks
Small micro-ellipsometer spot size (0.9 micron) eliminates under- and over-polishing
Enables control of polish rate and detection of polish slopes on areas as small as 7 micron x 7 micron
Spectrometer light source is can be changed in 15 minutes without any optics recalibration
Long-life light sources eliminate frequent changes and requalification
BPR (Beam Profile Reflectometry : thick dielectric films > 500A)
BPE (Beam Profile Ellipsometry : thin dielectric films < 500A)
Spectrometry (High Index films : C-Si, Poly-Si, A-Si)
*. Installed in Clean-room.