Menu

Nanometrics CD-50-2 Metrology

Ref : 1955674-9
Condition : Used
Manufacturer : Nanometrics
Model : CD-50-2 Metrology
Year(s) : -
Quantity : 1
Location : Seller or machines location:
AMERICA North (USA-Canada-Mexico)
Last check : 05 Aug. 2020

Nanometrics CD-50-2 Metrology

Description:
Critical Dimension Measurement MEASUREMENT SYSTEM TO INCLUDE: 1 NANOMETRICS MICROSCOPE WITH TRINOCULAR HEAD, ISOLATION STAND, WHK 10X/20L EYEPIECES, OBJECTIVES: MS PLAN 5X/0.13, MS PLAN 20X/0.46, ULWD MS PLAN 50X/0.55 X-Y-Z STAGE, computers 7 video camera,Critical Dimension Measurement System. Computer controlled scanning photometric microscope instrument designed for measuring line widths, gaps and registration alignment. The effective measuring range is 0.5 to 125.0 microns. Stage X-Y movement: 4 in. x 4 in. Scan time of less than 5 secs. Mfg. 1999. 115V, 50/60 Hz

Other machines similar to Nanometrics CD-50-2 Metrology

1
Location : AMERICA North (USA-Canada-Mexico)
1
Location : AMERICA North (USA-Canada-Mexico)
Year(s) : 1998
1
Location : AMERICA North (USA-Canada-Mexico)
1
Location : AMERICA North (USA-Canada-Mexico)
Year(s) : 1997