Others Singulus Singular PECVD
AMERICA North (USA-Canada-Mexico)
Like new, hardly used. Proof of concept, no production. Can do deposition on both sides of the wafers. We have the technical document available as well, and several other images.
The SINGULAR is equipped with two IR-heating stations and two individual
customized PECVD process stations. A support frame is receiving the aluminum made main
vacuum chamber. The different process stations are mounted on the main vacuum chamber. A
transfer handling is exchanging the substrates carriers from the loading/unloading module into
the load lock of the process module. The process gas dosing is controlled by high precision
mass flow controllers for each process chamber independently. The vacuum is controlled by
high efficient turbo pumps, suitable for the applied process. All vacuum components, vacuum
gauges and vacuum safety switches are included.
The substrate carries are hold inside the vacuum chamber. Substrates are passing through the
process module in a sequence of different stations.
The sequence is:
PS1 – IR heating station
PS2 – PECVD coating top down for intrinsic a-Si (“clean chamber”)
PS3 – IR heating station
PS4 – PECVD coating top down for dopted a-Si, SiOx, SiNx (“dirty chamber”)