Oxford NGP1000 ICP 380

- Load Locked Chamber
- Carrier Plate to run batches of (qty 4) 150mm wafers per run
- Carrier Plate to run batches of (qty 6) 100mm wafers per run
- System PC, Keyboard, Mouse
- Windows 7 w/ PC4000 Software
- Heated or Fluid-Cooled RIE Etch Lower Electrode w/ 3,000W, 13.56MHz RF Generator
- 490mm Diameter Aluminum Lower Electrode
- 208V ICP380 Source w/ 5kW, 2MHz RF Generator w/ Electrostatic Shield
- Dual Magnetic Spacer for improved ICP uniformity with little to no RIE Power
- Mechanical Wafer Clamping
- Optical Endpoint Detector
- Pneumatic Chamber Lift Kit
- Chamber Heating Kit
- Adixen ATH1600MT Turbo Pump
- Adixen ADP122P Dry Pump
- Adixen ACP40G Dry Pump
- Julabo FC1600 Chiller
- Operations Manual and Documentation